Enhancing Hot\nCarrier Photoelectric Efficiency through\nthe Boosted Collection of Hot Holes via Au/ZrO<sub>2</sub>/Si Tunneling\nJunctions

Metallic nanoparticles can generate\nphotoexcited hot carriers on\nthe femtosecond scale under light excitation, which holds immense\nsignificance for applications such as optical communication and ultrafast\nimaging. In this study, a tunnelling junction structure with ZrO<sub>2</sub> as the dielectric layer is designed and fabricated to achieve\nefficient hot hole collection between Au nanoparticles and P-type\nSi. Through characterizations of photoconductive atomic force microscopy,\nthe electrical transition from an ohmic contact to a tunneling junction\nis confirmed, and the transfer pathway of Au hot holes to P-type Si\nupon 520 nm excitation is clearly observed. The impact of the tunneling\nstructure on device performance is investigated through the fabrication\nof Si/ZrO<sub>2</sub>/Au/TiO<sub>2</sub> photodiodes. The performance\ntests show that hot hole collection by the tunneling effect significantly\nenhances a range of parameters, e.g., external quantum efficiency\nby 250%. Noticeably, the external quantum efficiency attributed to\nphotogenerated hot carriers under 520 nm excitation is estimated to\nexceed 2.5%. Moreover, the transient photoresponse of the photodiodes\nis examined with a typical rising time of less than 20 ns.

Publication Details

Journal
Figshare
Published
2024-09-19
DOI
https://doi.org/10.1021/acs.jpclett.4c02021.s001
Primary Topic
Semiconductor materials and interfaces
Type
article
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article

Enhancing Hot\nCarrier Photoelectric Efficiency through\nthe Boosted Collection of Hot Holes via Au/ZrO2/Si Tunneling\nJunctions

Figshare
Semiconductor materials and interfaces
article

Enhancing Hot\nCarrier Photoelectric Efficiency through\nthe Boosted Collection of Hot Holes via Au/ZrO2/Si Tunneling\nJunctions

article en

Abstract

Metallic nanoparticles can generate\nphotoexcited hot carriers on\nthe femtosecond scale under light excitation, which holds immense\nsignificance for applications such as optical communication and ultrafast\nimaging. In this study, a tunnelling junction structure with ZrO<sub>2</sub> as the dielectric layer is designed and fabricated to achieve\nefficient hot hole collection between Au nanoparticles and P-type\nSi. Through characterizations of photoconductive atomic force microscopy,\nthe electrical transition from an ohmic contact to a tunneling junction\nis confirmed, and the transfer pathway of Au hot holes to P-type Si\nupon 520 nm excitation is clearly observed. The impact of the tunneling\nstructure on device performance is investigated through the fabrication\nof Si/ZrO<sub>2</sub>/Au/TiO<sub>2</sub> photodiodes. The performance\ntests show that hot hole collection by the tunneling effect significantly\nenhances a range of parameters, e.g., external quantum efficiency\nby 250%. Noticeably, the external quantum efficiency attributed to\nphotogenerated hot carriers under 520 nm excitation is estimated to\nexceed 2.5%. Moreover, the transient photoresponse of the photodiodes\nis examined with a typical rising time of less than 20 ns.

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Semiconductor materials and interfaces
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