Supplementary document for Fast diffraction model of lithography mask based on improved pixel-to-pixel generative adversarial network - 6481639.pdf

The difference plots of DNFs between the rigorous EMF method and various deep learning models

Publication Details

Journal
Figshare
Published
2025-01-01
DOI
https://doi.org/10.6084/m9.figshare.23561079
Primary Topic
Advancements in Photolithography Techniques
Type
article
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Supplementary document for Fast diffraction model of lithography mask based on improved pixel-to-pixel generative adversarial network - 6481639.pdf

Figshare
Advancements in Photolithography Techniques
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Supplementary document for Fast diffraction model of lithography mask based on improved pixel-to-pixel generative adversarial network - 6481639.pdf

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Abstract

The difference plots of DNFs between the rigorous EMF method and various deep learning models

Figshare
Openalex Percentile: Top 54%
Advancements in Photolithography Techniques
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Supplementary document for Fast diffraction model of lithography mask based on improved pixel-to-pixel generative adversarial network - 6481639.pdf · Figshare (2025) | TGRS Research Map | TGRS