(Holloway) Chew, Kean Ho's Research & Libre License
A published research and experimentation friendly open-source license originally for (Holloway) Chew, Kean Ho but is now open to all product licensing purposes. This license was referenced from Open Source Initiative's BSD 3 Clauses License, Open Source Initiative's BSD 3 Clauses Clear License, Open Source Initiative's BSD 2 Clauses Patent License, Open Source Initiative's BSD 2 Clauses License, and Open Source Initiative's MIT License but was adopted and written from the Open Source Initiative's Apache 2.0 License and Creative Common Licenses as its baseline and applied the following changes: Changed Software to Product so that the license can be expanded to non-software product licensing usage (e.g. graphics, video, manufacturing design, audio, etc) without needing to spin multiple outbound licenses; AND Added license assignment, ratification, and tenure section to specify when and how is the license applied; AND Added version controlled clauses for which version shall be in effect by default; AND Added artifical intelligence training dataset usage clauses; AND Added Sensitive Data warranty and liability coverage; AND Added global vendors (e.g. datacenter) Sensitive Data limitation of liability; AND Added force manjure limitation of liability; AND Added global vendors (e.g. datacenter) Sensitive Data limitation of liability; AND Added judiciary minimal damage values limitation of liability; AND Expanded grant clauses into Creative Commons' rights categories; AND Added geographical indicator coverage; AND Added protected geographical indicator coverage; AND Added protected designation indicator coverage; AND Added industrial design use coverage; AND Added integrated circuit layout design use coverage; AND Added trade secret use coverage. This repository was formally known as (Holloway) Chew, Kean Ho BSD 3 Clauses License but was renamed for consistency purposes. Version Controlled This repository is version controlled using semantic versioning definitions where: the MAJOR version denotes major legal changes; AND the MINOR version denotes minor changes without altering the legal implication side of things such as but not limited to grammar correction, fonts, typo, and etc; AND the PATCH version denotes the repository management changes such as but not limited to new language addition, updating README.md, and etc. License Nature To use this license for your product licensing, you MUST, in layman terms, consider the following as your recipient perpectives: You're only allowed to use for personal deployment as long as you: SHALL AND STRICTLY REQUIRED to attribute to the copyright holders; AND SHALL accept that the creators are not responsible for anything of any kind; AND SHALL retain the copyright notices and effects of the product you use, be it in its raw form (e.g. source codes) or its produced form (compiled software binary files); AND SHALL NOT use the creators' name, brand, and trademark without their written notices for any endorsement of your pursue; AND are NOT REQUIRED to expose and upstream your changes back to the copyright holders all the way back to us (copyleft effect); AND SHALL, when applicable, obtain the grant of registered IP (e.g. patent, industrial design, IC layout design, etc) directly from the owner on your own before use; AND You're only allowed to use for commercial deployment as long as you: SHALL AND STRICTLY REQUIRED to attribute to the copyright holders; AND SHALL accept that the creators are not responsible for anything of any kind; AND SHALL retain the copyright notices and effects of the product you use, be it in its raw form (e.g. source codes) or its produced form (compiled software binary files); AND SHALL NOT use the creators' name, brand, and trademark without their written notices for any endorsement of your pursue; AND are NOT REQUIRED to expose and upstream your changes back to the copyright holders all the way back to us (copyleft effect); AND SHALL, when applicable, obtain the grant of registered IP (e.g. patent, industrial design, IC layout design, etc) directly from the owner on your own before use; AND You're only allowed to edit/modify as long as you: SHALL AND STRICTLY REQUIRED to attribute to the copyright holders; AND SHALL accept that the creators are not responsible for anything of any kind; AND SHALL retain the copyright notices and effects of the product you use, be it in its raw form (e.g. source codes) or its produced form (compiled software binary files); AND SHALL NOT use the creators' name, brand, and trademark without their written notices for any endorsement of your pursue; AND are NOT REQUIRED to expose and upstream your changes back to the copyright holders all the way back to us (copyleft effect); AND SHALL, when applicable, obtain the grant of registered IP (e.g. patent, industrial design, IC layout design, etc) directly from the owner on your own before use; AND You're only allowed to remix/remaster as long as you: SHALL AND STRICTLY REQUIRED to attribute to the copyright holders; AND SHALL accept that the creators are not responsible for anything of any kind; AND SHALL retain the copyright notices and effects of the product you use, be it in its raw form (e.g. source codes) or its produced form (compiled software binary files); AND SHALL NOT use the creators' name, brand, and trademark without their written notices for any endorsement of your pursue; AND are NOT REQUIRED to expose and upstream your changes back to the copyright holders all the way back to us (copyleft effect); AND SHALL, when applicable, obtain the grant of registered IP (e.g. patent, industrial design, IC layout design, etc) directly from the owner on your own before use; AND You're only allowed to distribute as long as you: SHALL AND STRICTLY REQUIRED to attribute to the copyright holders; AND SHALL accept that the creators are not responsible for anything of any kind; AND SHALL retain the copyright notices and effects of the product you use, be it in its raw form (e.g. source codes) or its produced form (compiled software binary files); AND SHALL NOT use the creators' name, brand, and trademark without their written notices for any endorsement of your pursue; AND are NOT REQUIRED to expose and upstream your changes back to the copyright holders all the way back to us (copyleft effect); AND SHALL, when applicable, obtain the grant of registered IP (e.g. patent, industrial design, IC layout design, etc) directly from the owner on your own before use; AND You're only allowed to re-distribute as long as you: SHALL AND STRICTLY REQUIRED to attribute to the copyright holders; AND SHALL accept that the creators are not responsible for anything of any kind; AND SHALL retain the copyright notices and effects of the product you use, be it in its raw form (e.g. source codes) or its produced form (compiled software binary files); AND SHALL NOT use the creators' name, brand, and trademark without their written notices for any endorsement of your pursue; AND are NOT REQUIRED to expose and upstream your changes back to the copyright holders all the way back to us (copyleft effect); AND SHALL, when applicable, obtain the grant of registered IP (e.g. patent, industrial design, IC layout design, etc) directly from the owner on your own before use; AND You're only allowed to perform any miscellaneous rights not mentioned above as long as you: SHALL AND STRICTLY REQUIRED to attribute to the copyright holders; AND SHALL accept that the creators are not responsible for anything of any kind; AND SHALL retain the copyright notices and effects of the product you use, be it in its raw form (e.g. source codes) or its produced form (compiled software binary files); AND SHALL NOT use the creators' name, brand, and trademark without their written notices for any endorsement of your pursue; AND are NOT REQUIRED to expose and upstream your changes back to the copyright holders all the way back to us (copyleft effect); AND SHALL, when applicable, obtain the grant of registered IP (e.g. patent, industrial design, IC layout design, etc) directly from the owner on your own before use.
Publication Details
- Journal
- Zenodo (CERN European Organization for Nuclear Research)
- Published
- 2024-09-18
- DOI
- https://doi.org/10.5281/zenodo.13854964
- Primary Topic
- Intellectual Property and Patents
- Type
- article
- Field-Weighted Citation Impact
- 0.00