Design and preparation of 222nm deep ultraviolet thin films

This paper proposes a design scheme for a deep ultraviolet anti-reflective film, with a substrate material of JGS1, and high and low refractive index materials of Al2O3 and AlF3, respectively. The Essential Macleod optical thin film design software was used to simulate the 222nm deep ultraviolet anti-reflective film. The simulation results show a transmission rate of 99.99%at 222nm. However, due to the presence of scattering and absorption, the actual experimental transmission rate is 99.2%. Although the actual transmission rate is 0.79%lower than the theoretical value, it still meets the application requirements.