Mechanically Stable\nand Damage Resistant Freestanding\nUltrathin Silver Nanowire Films with Closely Packed Crossed-Lamellar\nStructure

One-dimensional (1D) functional nanowires are widely\nused as nanoscale\nbuilding blocks for assembling advanced nanodevices due to their unique\nfunctionalities. However, previous research has mainly focused on\nnanowire functionality, while neglecting the structural stability\nand damage resistance of nanowire assemblies, which are critical for\nthe long-term operation of nanodevices. Biomaterials achieve excellent\nmechanical stability and damage resistance through sophisticated structural\ndesign. Here, we successfully prepared a mechanically stabilized monolamella\nsilver nanowire (Ag NW) film, based on a facile bubble-mediated assembly\nand nondestructive transfer strategy with the assistance of a porous\nmixed cellulose ester substrate, inspired by the hierarchical structure\nof biomaterial. Owing to the closely packed arrangement of Ag NWs\ncombined with their weak interfaces, the monolamellar Ag NW film can\nbe transferred to arbitrary substrates without damage. Furthermore,\nfreestanding multilamellar Ag NW films with impressive damage resistance\ncan be obtained from the monolamellar Ag NW film, through the introduction\nof bioinspired closely packed crossed-lamellar (CPCL) structure. This\nCPCL structure maximizes intra- and interlamellar interactions among\nAg NWs ensuring efficient stress transfer and uniform electron transport,\nresulting in excellent mechanical durability and stable electrical\nproperties of the multilamellar Ag NW films.