Operando Characterization\nof Electrochemistry at the\nRutile TiO<sub>2</sub>(110)/0.1 M HCl Interface Using Ambient Pressure\nXPS

Ambient pressure X-ray photoelectron spectroscopy (AP-XPS)\nwas\nemployed to investigate the effect of applied potential on the interface\nof TiO<sub>2</sub>(110) with 0.1 M HCl. The study, which involved\noperando electrochemical characterization, enabled real-time monitoring\nand analysis of electrochemical processes. There is a significant\ninfluence on the interface composition; in particular, the surface\nCl<sup>–</sup> surface coverage varies with electrochemical\npotential. Moreover, there appears to be a reaction of evolved Cl\nwith adventitious carbon to form C–Cl and C–Cl<sub>2</sub> species.