Plasma Sputtering Halide Perovskite for Photovoltaic\nApplications

Halide\nperovskite solar cells (PSCs) have reached a certified efficiency\nof 26.1% due to the excellent photoelectric properties of perovskite\nthin films, showing significant commercialization prospects. Preparing\nhigh-performance PSCs with uniform, large-area perovskite thin films\nremains challenging. Magnetron sputtering is a common method of film\npreparation in industry, which has the advantage of easy control over\nfilm crystallization, high repeatability, and low cost. And recently,\nit also exhibits promise in perovskite thin film preparation. This\nreview first introduces the principle and the advantages of magnetron\nsputtering of perovskite thin films, where the role of plasma is highlighted.\nThen, the effects of plasma on perovskite film quality are systematically\ndiscussed, including the elemental ratio, crystallinity, and defect\ndensity. Subsequently, we review the recent advances in magnetron\nsputtering of perovskite thin films for photovoltaic applications.\nFinally, possible directions for fabricating high-quality perovskite\nthin films and high-performance PSCs via magnetron sputtering are\ndiscussed, including sputtering process optimization, target composition\nadjustment, and post-treatment processes. With these strategies, the\ndevelopment of magnetron sputtered PSCs toward commercialization may\nbe achieved soon.