Photolithography-Free,\nSolution-Processable Perovskite\nElectrodes for High-Performance Organic Transistors

Solution-processable electrodes are promising for next-generation\nelectronics due to their simplicity, cost-effectiveness, and potential\nfor large-area fabrication. However, current solution-processable\nelectrodes based on conductive polymers, carbon-based compounds, and\nmetal nanowires face challenges related to stability, patterning,\nand production scalability. Here we introduce a novel approach using\n3D tin halide perovskites (THPs) combined with a photolithography-free\nsolution patterning technique to fabricate solution-processed electrodes.\nWe demonstrate the preparation of highly conductive CsSnI<sub>3</sub> films (234.9 S cm<sup>–1</sup>) and the fabrication of patterned\n35 × 35 perovskite electrode arrays on a 4-in. silicon wafer.\nThese electrodes, used as source/drain electrodes in organic transistors,\nresulted in devices showing high uniformity and stability. This electrode\nfabrication strategy is also applicable to other 3D THPs like FASnI<sub>3</sub> and MASnI<sub>3</sub>, showcasing versatility for diverse\napplications. The results highlight the feasibility and advantages\nof using 3D THPs as solution-processable electrodes, providing a new\nmaterial system for the advancement of solution-processed electronics.