X-RAY DIFFRACTION STUDY OF THE PRODUCT OF HIGH-TEMPERATURE DIFFUSION OF MANGANESE IN CRYSTALLINE SILICON OF SAMPLE KDB-3

The object of study was the KDB-3 sample – crystalline silicon (Si) doped with boron (B) and containing oxygen (O). During the experiments, high-temperature diffusion of manganese (Mn) into the crystalline Si structure was carried out at temperatures of 1125–1200°C.

Publication Details

Journal
Zenodo (CERN European Organization for Nuclear Research)
Published
2025-05-16
DOI
https://doi.org/10.5281/zenodo.15430241
Primary Topic
Reconstructive Facial Surgery Techniques
Type
article
Field-Weighted Citation Impact
0.00
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article

X-RAY DIFFRACTION STUDY OF THE PRODUCT OF HIGH-TEMPERATURE DIFFUSION OF MANGANESE IN CRYSTALLINE SILICON OF SAMPLE KDB-3

Zenodo (CERN European Organization for Nuclear Research)
Reconstructive Facial Surgery Techniques
article

X-RAY DIFFRACTION STUDY OF THE PRODUCT OF HIGH-TEMPERATURE DIFFUSION OF MANGANESE IN CRYSTALLINE SILICON OF SAMPLE KDB-3

article en

Abstract

The object of study was the KDB-3 sample – crystalline silicon (Si) doped with boron (B) and containing oxygen (O). During the experiments, high-temperature diffusion of manganese (Mn) into the crystalline Si structure was carried out at temperatures of 1125–1200°C.

Zenodo (CERN European Organization for Nuclear Research)
Openalex Percentile: Top 37%
Reconstructive Facial Surgery Techniques
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