Additive manufactured cerium oxide foils, used as pads for polishing processes of brittle-hard materials

\nA new concept for polishing pads for flat and spherical surfaces is introduced which comprises additive manufactured polishing pads made of cerium oxide. By using additive manufacturing technologies, polishing processes with polishing slurry can be substituted with tools containing bonded grain. The bonded polishing pads can be fabricated using rolling processes. The pad geometries can be adjusted by using laser cutting. Furthermore, surface modifications of the pad can be applied with laser processes to favour quality and economic factors of the polishing procedure. First results from the experimental setup are showing, that lapped surfaces with a roughness Rq of ~ 500 nm can be improved to approx. Rq = 30 nm roughness by polishing with bonded grain cerium oxide foils. Further approaches for future investigations and applications are proposed.\n

Publication Details

Journal
Springer Link (Chiba Institute of Technology)
Published
2024-10-31
DOI
https://doi.org/10.1051/epjconf/202430903004/pdf
Primary Topic
Advanced Surface Polishing Techniques
Type
article
Field-Weighted Citation Impact
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article

Additive manufactured cerium oxide foils, used as pads for polishing processes of brittle-hard materials

Springer Link (Chiba Institute of Technology)
Advanced Surface Polishing Techniques
article

Additive manufactured cerium oxide foils, used as pads for polishing processes of brittle-hard materials

article en

Abstract

\nA new concept for polishing pads for flat and spherical surfaces is introduced which comprises additive manufactured polishing pads made of cerium oxide. By using additive manufacturing technologies, polishing processes with polishing slurry can be substituted with tools containing bonded grain. The bonded polishing pads can be fabricated using rolling processes. The pad geometries can be adjusted by using laser cutting. Furthermore, surface modifications of the pad can be applied with laser processes to favour quality and economic factors of the polishing procedure. First results from the experimental setup are showing, that lapped surfaces with a roughness Rq of ~ 500 nm can be improved to approx. Rq = 30 nm roughness by polishing with bonded grain cerium oxide foils. Further approaches for future investigations and applications are proposed.\n

Springer Link (Chiba Institute of Technology)
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Advanced Surface Polishing Techniques
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