Self-Aligned Phase Separation for IBC Cells Using PVD Polysilicon

We introduce an innovative IBC solar cell process leveraging the directional deposition nature of doped polycrystalline silicon (poly-Si) through physical vapor deposition (PVD). This method enables the self-alignment of passivated contacts, effectively separating the polarities. The self-aligned back contact (SABC) cell incorporates n-type and p-type passivated contacts, achieved through interfacial oxide (SiOX) and doped n- and p-type poly-Si layers respectively, arranged in an interdigitated design on the back side. The insulation between the p-type and n-type poly-Si layers requires only a single structuring process of the firstly deposited p-type poly-Si. The subsequent blanket deposition of n-type poly-Si by PVD remains insulated from the p-type poly-Si layer due to the self-alignment properties inherent in our structuring and deposition processes. The SABC target process sequence can be implemented into existing TOPCon manufacturing lines requiring only two additional processing tools.

Publication Details

Journal
EU PVSEC
Published
2024-11-14
DOI
https://doi.org/10.4229/eupvsec2024/1bo.4.4
Primary Topic
Silicon and Solar Cell Technologies
Type
article
Field-Weighted Citation Impact
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article

Self-Aligned Phase Separation for IBC Cells Using PVD Polysilicon

EU PVSEC
Silicon and Solar Cell Technologies
article

Self-Aligned Phase Separation for IBC Cells Using PVD Polysilicon

article en

Abstract

We introduce an innovative IBC solar cell process leveraging the directional deposition nature of doped polycrystalline silicon (poly-Si) through physical vapor deposition (PVD). This method enables the self-alignment of passivated contacts, effectively separating the polarities. The self-aligned back contact (SABC) cell incorporates n-type and p-type passivated contacts, achieved through interfacial oxide (SiOX) and doped n- and p-type poly-Si layers respectively, arranged in an interdigitated design on the back side. The insulation between the p-type and n-type poly-Si layers requires only a single structuring process of the firstly deposited p-type poly-Si. The subsequent blanket deposition of n-type poly-Si by PVD remains insulated from the p-type poly-Si layer due to the self-alignment properties inherent in our structuring and deposition processes. The SABC target process sequence can be implemented into existing TOPCon manufacturing lines requiring only two additional processing tools.

EU PVSEC
Openalex Percentile: Top 68%
Silicon and Solar Cell Technologies
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