Optimizations of\nLiquid Phase Deposition Processes\nfor Enhanced Photoelectrocatalytic Activities of Tungsten Oxide Thin\nFilms

This study focuses\non the preparation of tungsten oxide (WO<sub>3</sub>) as the photoanode\nfor water oxidations by the liquid phase\ndeposition (LPD) technique and its optimizations to improve the photoelectrochemical\nperformance. The alternative precursor large stock solution process\nwas achieved to simplify the LPD process for WO<sub>3</sub> thin film\npreparation. The effect of boric acid in the precursor solutions on\nthe physicochemical properties of the deposited WO<sub>3</sub> thin\nfilms was investigated. As a result, we found that the optimized concentration\nof boric acid realized the highest photoelectrochemical performance.\nThrough the optimizations of reaction conditions and surface analyses,\nwe concluded that the preparations of a semiconductor film via the\nLPD technique had the potential to obtain high-performance photoelectrocatalytic\napplications.