Multiparameter Method\nfor Developer Screening of Molecular\nGlass Resists via Molecular Simulations

Efficient and accurate developer screening is critical\nfor high-resolution\nlithography. In this study, a multiparameter (MP) method simultaneously\nbased on the Hansen solubility parameters (HSP), two-component solubility\nparameters (TSP), and order parameter (OP) is proposed for the developer\nscreening of molecular glass resists via molecular dynamics simulation.\nA customized solvent database, including 80 organic solvents, is created\nfor the subsequent developer screening. Two diagram forms of HSP (<i>δ</i><sub><i>D</i></sub>-<i>δ</i><sub><i>P</i></sub>-<i>δ</i><sub><i>H</i></sub> diagram and <i>δ</i><sub><i>V</i></sub>-<i>δ</i><sub><i>H</i></sub> diagram) were investigated, and the <i>δ</i><sub><i>V</i></sub>-<i>δ</i><sub><i>H</i></sub> diagram is utilized due to its higher solubility prediction\nconsistency with OP. Then, two solubility prediction diagrams, i.e.,\nHSP&OP and TSP&OP diagrams, were formed using the MP method.\nThe developer screening scheme using the MP method is illustrated\nfor a decomposable resist, AD10BOC, and a cross-linkable resist, AD4C.\nMeanwhile, the feasibility of the developer screening scheme is verified\nby practical lithography experiments. In addition, relative solvation\nfree energy (RSFE) calculations and dissolution experiments of six\nresists are implemented to further confirm the accuracy of OP in reflecting\nthe relative solubility of the resist in various solvents. This study\npresents a viable approach for developer screening, which will facilitate\nthe development of resist materials.