Investigating the Doping Effects on the Optical, Electrical, Structural, Morphological, Elemental Composition, and Magnetic Properties of Electrodeposited TI-Doped Cus Thin Films

Successfully, thin films of copper (II) sulfide (CuS) and titanium-doped copper (II) sulfide (Ti:CuS) havebeen deposited on fluorine tin-doped oxide (FTO) glass substrates, using electrodeposition technique, at roomtemperature. The films were characterized to investigate their optical, structural, morphological, compositional,electrical, and magnetic properties, using UV-Vis spectrophotometer (at wavelength range of 300 nm – 1100nm), x-ray diffractometer machine, scanning electron microscope equipped with energy dispersive x-rayspectroscope, four-point probe technique, and vibrating sample magnetometer (VSM), respectively. Thickness ofthe films was obtained using a profilometer, and thickness values of 109.16 nm, 113.17 nm, 121.11 nm, and131.79 nm were obtained for the undoped CuS thin film, 2 % Ti doped, 6 % Ti doped, and 10 % Ti doped thinfilms, respectively. Optical bandgap of the films range between 2.40 eV and 2.60 eV. Structural analysis of thefilms confirmed hexagonal phase of CuS with lattice constant, a₌b ₌ 3.7920 Å and c ₌ 16.3440 Å