Microstructural Analysis on the Conformity of Chemical Vapour Deposition (CVD) Perovskite Thin-Films on Silicon for Tandem PV Devices

Perovskite-based solar cells are a rapidly emerging technology, with lab-scale devices achieving power conversion efficiency (PCE) performance close to commercial scale Silicon solar cells. To enable future commercialisation and large-scale production, CSIRO has developed a chemical vapour deposition (CVD) method that allows for the fabrication of repeatable, highly uniform perovskites layers with a scalability factor of 20× from laboratory scale devices. The sensitivity of perovskites presents handling challenges for both film analysis and production. An extensive study is presented on the conformity of perovskite film via CVD produced sample substrates. In this work we have successfully demonstrated that deposition of ultra-thin (5-50 nm) lead (Pb) precursor layers on industrial silicon wafers and subsequent conversion via a novel CVD technique enables retention of a controlled thickness and conformal perovskite absorber layer on highly variable textured silicon substrates.