The Effect of Freatments with UV-LED and High Voltage Pulse Cold Plasma on Infected Corn and Aspergillus flavus

The objective of this study was to investigate the effects of 265 nm-LED and high-voltage pulsed cold plasma treatments on the quality of maize with a water content of 14%, as well as the inactivation mechanism of Aspergillus flavus spores. The experimental results indicate that both 265 nm-LED and high-voltage pulsed cold plasma effectively inactivate fungal infections on corn. Specifically, after 10 min of 265 nm-LED treatment, the inactivation fungal rate of infected corn reached 46%, while high-voltage pulsed cold plasma treatment only achieved an inactivation rate of less than 20%. Furthermore, no significant changes was observed on fatty acid values (P>0.05), but both treatments caused moderate damage to the surface of corn kernels and granules. Regarding Aspergillus flavus spores, both treatments disrupted the outer cell wall, leading to leakage of intercellular components and eventual spore inactivation.