An integrated exposure and measurement tool for 5-DOF direct laser writing

\nAccurate and uniform fabrication of microstructures on highly curved substrates requires exposure with the waist of a focused laser beam at every point. In order to realize this, the exposure beam must be held perpendicular and focused onto the local substrate. Here we present an optical tool for our developed 5-axis nano-positioning and nano-measurement machine based on the chromatic differential confocal microscope.\n