Chemically\nTailored Growth of 2D Semiconductors via\nHybrid Metal–Organic Chemical Vapor Deposition

Two-dimensional (2D)\nsemiconducting transition-metal dichalcogenides\n(TMDCs) are an exciting platform for excitonic physics and next-generation\nelectronics, creating a strong demand to understand their growth,\ndoping, and heterostructures. Despite significant progress in solid-source\n(SS-) and metal–organic chemical vapor deposition (MOCVD),\nfurther optimization is necessary to grow highly crystalline 2D TMDCs\nwith controlled doping. Here, we report a hybrid MOCVD growth method\nthat combines liquid-phase metal precursor deposition and vapor-phase\norgano-chalcogen delivery to leverage the advantages of both MOCVD\nand SS-CVD. Using our hybrid approach, we demonstrate WS<sub>2</sub> growth with tunable morphologiesfrom separated single-crystal\ndomains to continuous monolayer filmson a variety of substrates,\nincluding sapphire, SiO<sub>2</sub>, and Au. These WS<sub>2</sub> films\nexhibit narrow neutral exciton photoluminescence line widths down\nto 27–28 meV and room-temperature mobility up to 34–36\ncm<sup>2</sup> V<sup>–1</sup> s<sup>–1</sup>. Through\nsimple modifications to the liquid precursor composition, we demonstrate\nthe growth of V-doped WS<sub>2</sub>, Mo<sub><i>x</i></sub>W<sub>1–<i>x</i></sub>S<sub>2</sub> alloys, and\nin-plane WS<sub>2</sub>–MoS<sub>2</sub> heterostructures. This\nwork presents an efficient approach for addressing a variety of TMDC\nsynthesis needs on a laboratory scale.