High <i>L</i>1<sub>0</sub>‑Orderingand Flat Surface Introducing a Two-Step Heating Process with Frank–Vander Merwe Initial Growth Mode at Low Temperature

FePd films were epitaxially grown on SrTiO<sub>3</sub> (001) substrates by rf magnetron sputtering. The preferred crystal orientation of FePd was (111)<sub>fcc</sub> when the substrate temperature (<i>T</i><sub>s</sub>) was room temperature during film deposition. Above <i>T</i><sub>s</sub> = 150 °C, the main preferred orientation of FePd changed from (111) to (001). Above <i>T</i><sub>s</sub> = 400 °C, the degree of <i>L</i>1<sub>0</sub> ordering (S<sub>L10</sub>) of FePd increased monotonically and reached 0.88 at <i>T</i><sub>s</sub> = 600 °C. Below <i>T</i><sub>s</sub> = 350 °C, a flat surface was formed, which might be considered Frank–Van der Merwe’s (FM) mode growth. Above <i>T</i><sub>s</sub> = 400 °C, the surface roughness (<i>R</i><sub>a</sub>) increased and reached <i>R</i><sub>a</sub> of 3.9 nm at <i>T</i><sub>s</sub> = 600 °C. We call this as a ‘<i>one-step heating process</i>’. The high S<sub>L10</sub> and flat surface were not simultaneously obtained by the one-step heating process. We introduced the ’<i>two-step heating method</i>’ to obtain high S<sub>L10</sub> and flat surface simultaneously: the films were grown at low <i>T</i><sub>s</sub>, followed by postannealing at <i>T</i><sub>a</sub> = 600 °C. This two-step heating method realized a high S<sub>L10</sub> of 0.98 (considering the Pd excess composition) and a flat surface (<i>R</i><sub>a</sub> = 0.3 nm) by <i>T</i><sub>s</sub> = 150 °C followed by <i>T</i><sub>a</sub> = 600 °C. By the two-step heating, the S<sub>L10</sub> increased from 0.88 to 0.98, and the flatness improved from 3.9 to 0.3 nm. The flat surface is thought to be due to FM growth mode because FePd film was deposited at low <i>T</i><sub>s</sub> such as 150 °C, and once a flat surface was formed at low <i>T</i><sub>s</sub>, the flat surface was maintained even after <i>T</i><sub>a</sub> = 600 °C. For the reason for the high degree of <i>L</i>1<sub>0</sub> ordering at a flat surface, we consider that the flat surface reducing the atoms on the slope caused by coarse grains result in promoting <i>L</i>1<sub>0</sub> ordering. <i>K</i><sub>u</sub> was 1.04 MJ/m<sup>3</sup> at 300 K (1.20 MJ/m<sup>3</sup> at 10 K), and the high perpendicular magnetic anisotropy (PMA) resulted in a small temperature dependence of <i>K</i><sub>u</sub> and <i>M</i><sub>s</sub>. It is expected that the PMA can be increased to a theoretical value (2 MJ/m<sup>3</sup>) by removing the twin-like dislocations observed in the cross-sectional transmission electron microscope images.

Publication Details

Journal
Figshare
Published
2025-01-22
DOI
https://doi.org/10.1021/acs.cgd.4c01549.s001
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Magnetic properties of thin films
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article

High L10‑Orderingand Flat Surface Introducing a Two-Step Heating Process with Frank–Vander Merwe Initial Growth Mode at Low Temperature

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Magnetic properties of thin films
article

High L10‑Orderingand Flat Surface Introducing a Two-Step Heating Process with Frank–Vander Merwe Initial Growth Mode at Low Temperature

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Abstract

FePd films were epitaxially grown on SrTiO<sub>3</sub> (001) substrates by rf magnetron sputtering. The preferred crystal orientation of FePd was (111)<sub>fcc</sub> when the substrate temperature (<i>T</i><sub>s</sub>) was room temperature during film deposition. Above <i>T</i><sub>s</sub> = 150 °C, the main preferred orientation of FePd changed from (111) to (001). Above <i>T</i><sub>s</sub> = 400 °C, the degree of <i>L</i>1<sub>0</sub> ordering (S<sub>L10</sub>) of FePd increased monotonically and reached 0.88 at <i>T</i><sub>s</sub> = 600 °C. Below <i>T</i><sub>s</sub> = 350 °C, a flat surface was formed, which might be considered Frank–Van der Merwe’s (FM) mode growth. Above <i>T</i><sub>s</sub> = 400 °C, the surface roughness (<i>R</i><sub>a</sub>) increased and reached <i>R</i><sub>a</sub> of 3.9 nm at <i>T</i><sub>s</sub> = 600 °C. We call this as a ‘<i>one-step heating process</i>’. The high S<sub>L10</sub> and flat surface were not simultaneously obtained by the one-step heating process. We introduced the ’<i>two-step heating method</i>’ to obtain high S<sub>L10</sub> and flat surface simultaneously: the films were grown at low <i>T</i><sub>s</sub>, followed by postannealing at <i>T</i><sub>a</sub> = 600 °C. This two-step heating method realized a high S<sub>L10</sub> of 0.98 (considering the Pd excess composition) and a flat surface (<i>R</i><sub>a</sub> = 0.3 nm) by <i>T</i><sub>s</sub> = 150 °C followed by <i>T</i><sub>a</sub> = 600 °C. By the two-step heating, the S<sub>L10</sub> increased from 0.88 to 0.98, and the flatness improved from 3.9 to 0.3 nm. The flat surface is thought to be due to FM growth mode because FePd film was deposited at low <i>T</i><sub>s</sub> such as 150 °C, and once a flat surface was formed at low <i>T</i><sub>s</sub>, the flat surface was maintained even after <i>T</i><sub>a</sub> = 600 °C. For the reason for the high degree of <i>L</i>1<sub>0</sub> ordering at a flat surface, we consider that the flat surface reducing the atoms on the slope caused by coarse grains result in promoting <i>L</i>1<sub>0</sub> ordering. <i>K</i><sub>u</sub> was 1.04 MJ/m<sup>3</sup> at 300 K (1.20 MJ/m<sup>3</sup> at 10 K), and the high perpendicular magnetic anisotropy (PMA) resulted in a small temperature dependence of <i>K</i><sub>u</sub> and <i>M</i><sub>s</sub>. It is expected that the PMA can be increased to a theoretical value (2 MJ/m<sup>3</sup>) by removing the twin-like dislocations observed in the cross-sectional transmission electron microscope images.

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Magnetic properties of thin films
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