Novel Ru( <scp>ii</scp> )-photo-antibiotics for the development of infection-resistant mask coatings
Four novel Ru(II)-photoantibiotics (Ru1-Ru4) were developed to produce infection-resistant self-cleaning mask coatings. These photoantibiotics eliminate bacterial infections by generating oxidative stress and photothermal effects upon exposure to visible light (400-700 nm) with tuneable surface hydrophobicity.
Authors
- Samya Banerjee (ORCID: https://orcid.org/0000-0003-4393-4447)
- Prodyut Dhar (ORCID: https://orcid.org/0000-0001-9716-3866)
- Shakti Singh (ORCID: https://orcid.org/0000-0002-8412-5622)
- Arif Ali Mandal (ORCID: https://orcid.org/0009-0008-3645-1029)
- Apurba Mandal (ORCID: https://orcid.org/0000-0002-1693-0005)
- Saurav Kumar
Institutions
- Indian Institute of Technology BHU (IN)
- Banaras Hindu University (IN)
Publication Details
- Journal
- Chemical Communications
- Published
- 2025-12-08
- DOI
- https://doi.org/10.1039/d5cc06235g
- Primary Topic
- Nanoplatforms for cancer theranostics
- Type
- article
- Field-Weighted Citation Impact
- 0.00