Spatial limit of two-beam interference patterning with ultrashort laser pulses

Two-beam interference patterns generated with ultrashort laser pulses are essential for applications such as direct laser interference patterning. Here, coherent beams are made to interfere by overlapping on the processed surface. The area of the generated interference pattern can be adjusted by the transverse beam dimensions. The present study investigates the spatial limit of interference patterns. The results demonstrate that the boundaries of the interference pattern depend solely on the spectral energy distribution of the laser pulse, and the angle between the interfering beams. The variation in pulse duration, which arises in the non-bandwidth-limited case while maintaining the same spectral energy distribution, has no effect.

Authors

Publication Details

Journal
Optics Express
Published
2025-12-04
DOI
https://doi.org/10.1364/oe.582373
Primary Topic
Laser Material Processing Techniques
Type
article
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article

Spatial limit of two-beam interference patterning with ultrashort laser pulses

Alexander Peter, Tobias Menold, Andreas Michalowski, Thomas Graf
Optics Express
Laser Material Processing Techniques
article

Spatial limit of two-beam interference patterning with ultrashort laser pulses

Alexander Peter, Tobias Menold, Andreas Michalowski, Thomas Graf
article en

Abstract

Two-beam interference patterns generated with ultrashort laser pulses are essential for applications such as direct laser interference patterning. Here, coherent beams are made to interfere by overlapping on the processed surface. The area of the generated interference pattern can be adjusted by the transverse beam dimensions. The present study investigates the spatial limit of interference patterns. The results demonstrate that the boundaries of the interference pattern depend solely on the spectral energy distribution of the laser pulse, and the angle between the interfering beams. The variation in pulse duration, which arises in the non-bandwidth-limited case while maintaining the same spectral energy distribution, has no effect.

Optics ExpressVol. 33(25)
Openalex Percentile: Top 58%
Laser Material Processing Techniques
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