Chemical vapor deposition of compound semiconductors: process simulation and experimental validation
Abstract Chemical vapor deposition (CVD) is fundamental to semiconductor nanotechnology, yet many aspects of its processes and underlying physical and chemical phenomena remain unexplained. This is because CVD is a complex system involving the elementary growth processes of (1) gas-phase reactions, (2) surface processes, and (3) solid-phase diffusion. This review introduces the following research topics, utilizing theoretical approaches that integrate simulations of each fundamental process: the influence of CVD conditions on the residual impurity concentration, surface morphology, and heterointerface flatness. Through integrated simulation, physical and chemical insights that cannot be obtained from simulations of individual elementary growth processes are revealed.
Authors
- Paweł Kempisty (ORCID: https://orcid.org/0000-0003-0700-5560)
- Akira Kusaba (ORCID: https://orcid.org/0000-0002-1296-9180)
- Yoshihiro Kangawa (ORCID: https://orcid.org/0000-0002-4982-8883)
- Marta A. Chabowska (ORCID: https://orcid.org/0000-0002-8500-3889)
- Hristina Popova (ORCID: https://orcid.org/0000-0003-1590-0848)
- Toru Akiyama (ORCID: https://orcid.org/0000-0002-2800-2011)
- Shugo Nitta (ORCID: https://orcid.org/0000-0002-8258-186X)
- Hideto Miyake (ORCID: https://orcid.org/0000-0002-1054-666X)
- Motoaki Iwaya (ORCID: https://orcid.org/0000-0002-4889-706X)
- Magdalena A. Załuska–Kotur (ORCID: https://orcid.org/0000-0003-0488-8425)
Institutions
- Kyushu University (JP)
- Mie University (JP)
- Bulgarian Academy of Sciences (BG)
- Institute of Physical Chemistry (BG)
- Institute of High Pressure Physics (PL)
- Mie University Hospital (JP)
- Meijo University (JP)
- Polish Academy of Sciences (PL)
Publication Details
- Journal
- Applied Physics Express
- Published
- 2025-12-18
- DOI
- https://doi.org/10.35848/1882-0786/ae2f19
- Citations
- 1
- Primary Topic
- Semiconductor materials and devices
- Type
- article
- Field-Weighted Citation Impact
- 0.73