An Experimental Investigation of the Influence of Deposition Power and Pressure on the Anti-Icing and Wettability Properties of Al-Doped ZnO Thin Films Prepared by Magnetron Sputtering

In the presented research, aluminum-doped zinc oxide (AZO) thin films were synthesized on high-power transmission lines using the RF magnetron sputtering process. The impact of deposition power (160 W to 280 W) and deposition pressure (2 Pa to 5 Pa), on key characteristics like material composition, wettability, anti-icing behavior, and average crystal size were analyzed. The optimization of wettability and anti-icing performance was carried out using two-factor, four-level design of the Taguchi method to study the combined effects of multiple parameters rather than the effect of a single parameter. Considerable variation in the water contact angle, from 92.3° to 123.6°, has been observed, suggesting an enhancement in hydrophobic nature with optimized condition. Anti-icing tests demonstrated that the coated surface delayed ice accumulation by approximately 4.56 times compared to the uncoated surface. X-ray diffraction (XRD) analysis was carried out to confirm notable changes in the intensity of the (002) peak along the c-axis, directly correlating with grain size modification. The change in surface roughness was studied using AFM and the results were compared to establish a relationship between surface roughness and average grain size. Overall, the findings highlight the critical role of deposition parameters and their interactions in modifying the surface and structural properties of AZO thin films, which demonstrates their potential application for improving the anti-icing performance of transmission lines.