Light-Induced Giant Enhancement of the Nonlinear Hall Effect in Two-Dimensional Electron Gases at KTaO3 (111) Interfaces
The nonlinear Hall effect (NLHE), an emergent phenomenon in noncentrosymmetric systems, enables the generation of a transverse voltage without an external magnetic field through a second-order electrical response. However, achieving a sizable NLHE signal remains a critical challenge for its application in frequency-doubling and rectifying devices. Here, we report a light-induced giant enhancement of the NLHE in the two-dimensional electron gas (2DEG) at the CaZrO3/KTaO3 (111) interface. Under light illumination, the second harmonic Hall voltage (V2ω y) increases substantially and undergoes a sign reversal. Correspondingly,the second-order transverse conductivity increases by nearly five orders of magnitude, reaching 2.4 um V-1 omega-1, while also reversing its sign. Scaling analysis indicates that skew scattering is the dominant mechanism underlying the NLHE and is highly tunable via optical gating. Photoexcitation pumps electrons from in-gap states into the higher-lying Ta 5d conduction band, generating high-mobility photocarriers that significantly increase the cubic transport scattering time, thereby driving a dramatic enhancement of σ(2) yxx. First-principles calculations further reveal that the Berry curvature distribution on the Fermi surface strongly depends on band filling. As the Fermi level approaches a band crossing in the Ta 5d subband near the M point, the Berry curvature triple undergoes a sign change, accounting for the experimentally observed sign reversal of the nonlinear Hall response. Our work offers a new strategy to optically boost and tune the nonlinear Hall effect in oxide 2DEG systems, paving the way for applications in light-controlled rectification and nonlinear electronic devices.
Authors
- Jirong Sun (ORCID: https://orcid.org/0000-0003-4531-4794)
- Fengxia Hu (ORCID: https://orcid.org/0000-0003-0383-0213)
- Baogen Shen (ORCID: https://orcid.org/0000-0003-4819-1806)
- Min Li (ORCID: https://orcid.org/0000-0002-2959-9147)
- Yulin Bai (ORCID: https://orcid.org/0009-0008-8517-9180)
- Weisheng S. Zhao (ORCID: https://orcid.org/0000-0001-8088-0404)
- Yuansha Chen (ORCID: https://orcid.org/0000-0002-7291-5088)
- Yunzhong Chen (ORCID: https://orcid.org/0000-0001-8368-5823)
- Furong Han (ORCID: https://orcid.org/0009-0001-5239-2320)
- Hui Zhang (ORCID: https://orcid.org/0000-0003-2269-320X)
- Lu Chen (ORCID: https://orcid.org/0000-0001-5135-9767)
- Yongbing Xu
- Xiaobing Chen (ORCID: https://orcid.org/0000-0003-4327-1209)
- Huaiwen Yang
- Jine Zhang (ORCID: https://orcid.org/0000-0001-7949-3239)
- Jing Wu
- Weimin Qi (ORCID: https://orcid.org/0009-0003-4607-8129)
- D. Tian (ORCID: https://orcid.org/0009-0008-3534-9938)
Publication Details
- Journal
- ArXiv.org
- Published
- 2025-07-19
- Primary Topic
- Electronic and Structural Properties of Oxides
- Type
- article
- Field-Weighted Citation Impact
- 0.00