Sub-nanometer scale porosity emerging from SiOx plasma polymer films: characterization by positron annihilation spectroscopy

Abstract The enhancement of microporosity in HMDSO-derived plasma polymer films through sequential cycles of plasma polymerization and etching has been demonstrated using positron spectroscopy techniques. These thin films exhibit a labyrinthine nanoporous architecture, characterized by an interconnected pore network with bottlenecks. The configuration of the plasma reactor significantly influences the final nanoporous structure, governed by the balance between ion-induced densification and chemical oxidation of residual hydrocarbons. By fine-tuning the plasma parameters and reactor design, small nanopores within the Si–O–Si cage structure are optimized to approximately 0.3 nm. These structural units are acting as interconnections of larger nanopores around 0.65 nm, functionalized with Si–OH groups along the pore walls. The high precision of positron annihilation spectroscopy enables clear differentiation between samples, with complementary insights provided by ellipsometry and Rutherford backscattering spectroscopy. Further optimization of the intrinsic microporosity was achieved through near-plasma chemical surface engineering, effectively mitigating ion-induced densification. Given the application potential of superhydrophilic SiOx-like thin films, the thermal stability of the nanoporous network was evaluated at moderate temperatures, revealing excellent structural integrity. These findings support the use of plasma polymer films fabricated via polymerization of hexamethyldisiloxane followed by etching as advanced membrane materials, where well-defined, defect-free microporous structures are essential.