IMPROVEMENT OF METROLOGICAL CHARACTERISTICS OF ARC ATOMIC EMISSION DETERMINATION OF REFRACTORY IMPURITIES IN REFRACTORY MATRICES IN THE PRESENCE OF FLUORINE-CONTAINING ADDITIVES

This work is devoted to an important area of arc atomic emission analysis, namely, the study of the influence of chemically active additives on the metrological characteristics of determining refractory elements in refractory matrices. A number of scientific results published by the authors of the article are critically reviewed in comparison with literature data on the mechanism of action of these additives and their practical use. Over 25 years of experience and the results of such studies, the generalization of the identified patterns and advantages of fluorinating agents AlF, AgF, BaF, SrF, and ZnF allow concluding their universality in the analysis of refractory matrices and the feasibility of practical use in terms of improving the selectivity, sensitivity, and accuracy of arc atomic emission analysis determinations. It has been established that zinc fluoride is the most effective fluorinating agent for analyzing all studied matrices. Its use allowed reducing the limits of detection for refractory elements by 2–3 orders of magnitude compared to determinations without additives, as well as improving the convergence and accuracy of the results.