The influence of ion beam-synthesized InSb nanocrystals on current-voltage characteristics of SiO2 layers in MOS structures

Current density ( J ) as a function of electric field ( E ) at different temperatures ( T ) is studied in Al/SiO 2 <InSb> /Si/Al metal-oxide-semiconductor (MOS) structures fabricated using silicon-on-insulator and ion-beam synthesis technologies. The MOS structures containing SiO 2 layers implanted with Sb + and In + ions are investigated both before and after annealing at 800 and 1100 ℃. Annealing leads to the formation of InSb nanocrystals (5 – 25 nm in diameter) to result in a unique charge distribution within SiO 2 . Three distinct types of J ( E , T ) behavior are observed in the temperature range 2 < T < 300 K and at electric fields up to ±6.7 × 10 5 V/cm. At E < 4 × 10 4 V/cm, all samples exhibit ohmic conduction, whereas at higher fields ( E > 2 ×10 5 V/cm) the J ( E , T ) dependences follow the space charge-limited current (SCLC) models: Below 40 K, the Mott-Gurney law applies, indicating monoenergetic traps near the SiO 2 midgap. Above 40 K, the J ( E , T ) behavior is consistent with the Mark-Helfrich SCLC model, revealing an exponential energy distribution of traps in the “tails” of localized states in SiO 2 . These localized states are associated with an implantation-induced structural disorder. An energy band diagram of the annealed MOS structures has been developed to directly correlate the Fermi-level shifts and the evolution of trap states with the formation of InSb nanocrystals. This correlation provides a benchmark insight into the redistribution of free and localized charges in modified SiO 2 <InSb> layers and explains their influence on the observed J ( E , T ) characteristics. The contribution of this work lies in establishing a direct link between the nanocrystal-induced disorder and the charge redistribution in modified oxide layers subjected to annealing. • InSb nanocrystals in SiO 2 were obtained using SOI and ion-beam synthesis technology. • J - E curves follow two types of space charge-limited current models. • Two types of traps (monoenergetic, exponential) were detected based on J-E analysis. • J - E laws change when Fermi level crosses energy regions of different traps types. • An energy band structure and evolution of DOS diagrams are developed schematically.

Authors

Publication Details

Journal
Next Nanotechnology
Published
2025-12-09
DOI
https://doi.org/10.1016/j.nxnano.2025.100340
Primary Topic
Silicon Nanostructures and Photoluminescence
Type
article
Field-Weighted Citation Impact
0.00
Controls
|||
ALL TIME
JAN
FEB
MAR
APR
MAY
JUN
JUL
AUG
SEP
OCT
article

The influence of ion beam-synthesized InSb nanocrystals on current-voltage characteristics of SiO2 layers in MOS structures

Julia A. Fedotova, А.К. Fedotov, I. E. Tyschenko, Valeria Yu. Leonenko
Next Nanotechnology
Silicon Nanostructures and Photoluminescence
article

The influence of ion beam-synthesized InSb nanocrystals on current-voltage characteristics of SiO2 layers in MOS structures

Julia A. Fedotova, А.К. Fedotov, I. E. Tyschenko, Valeria Yu. Leonenko
article en

Abstract

Current density ( J ) as a function of electric field ( E ) at different temperatures ( T ) is studied in Al/SiO 2 <InSb> /Si/Al metal-oxide-semiconductor (MOS) structures fabricated using silicon-on-insulator and ion-beam synthesis technologies. The MOS structures containing SiO 2 layers implanted with Sb + and In + ions are investigated both before and after annealing at 800 and 1100 ℃. Annealing leads to the formation of InSb nanocrystals (5 – 25 nm in diameter) to result in a unique charge distribution within SiO 2 . Three distinct types of J ( E , T ) behavior are observed in the temperature range 2 < T < 300 K and at electric fields up to ±6.7 × 10 5 V/cm. At E < 4 × 10 4 V/cm, all samples exhibit ohmic conduction, whereas at higher fields ( E > 2 ×10 5 V/cm) the J ( E , T ) dependences follow the space charge-limited current (SCLC) models: Below 40 K, the Mott-Gurney law applies, indicating monoenergetic traps near the SiO 2 midgap. Above 40 K, the J ( E , T ) behavior is consistent with the Mark-Helfrich SCLC model, revealing an exponential energy distribution of traps in the “tails” of localized states in SiO 2 . These localized states are associated with an implantation-induced structural disorder. An energy band diagram of the annealed MOS structures has been developed to directly correlate the Fermi-level shifts and the evolution of trap states with the formation of InSb nanocrystals. This correlation provides a benchmark insight into the redistribution of free and localized charges in modified SiO 2 <InSb> layers and explains their influence on the observed J ( E , T ) characteristics. The contribution of this work lies in establishing a direct link between the nanocrystal-induced disorder and the charge redistribution in modified oxide layers subjected to annealing. • InSb nanocrystals in SiO 2 were obtained using SOI and ion-beam synthesis technology. • J - E curves follow two types of space charge-limited current models. • Two types of traps (monoenergetic, exponential) were detected based on J-E analysis. • J - E laws change when Fermi level crosses energy regions of different traps types. • An energy band structure and evolution of DOS diagrams are developed schematically.

Next NanotechnologyVol. 9
Openalex Percentile: Top 68%
Silicon Nanostructures and Photoluminescence
AI Navigator

Ask Laika to Summarize, Analyze, and Connect papers live on the map.

Summarize Papers & Methodologies

Extract key findings, datasets, and comparative methods across publications.

Benchmark Rankings & Visual Analytics

Rank top research institutions, authors, funders, topics, and journals by Field-Weighted Citation Impact (FWCI) and paper volume with instant charts.

Connect Distant Disciplines

Bridge topological clusters on the map to find hidden collaborative intersections.