Redox-Neutral Radical Annulation of Challenging Alkynes with Aryl Sulfoxonium Ylides for 1-Naphthol Synthesis

This radical strategy represents the first use of sulfoxonium ylide-derived radicals in 1-naphthol synthesis and overcomes the substrate limitations of classical carbene-based methods. It enables annulation of unactivated terminal alkynes─previously challenging substrates─under mild, metal- and additive-free, visible-light conditions. Mechanistic studies support formation of a highly electrophilic hindered radical cation that undergoes polarity-inverted addition and benzannulation, establishing sulfoxonium ylides as versatile radical precursors for modular 1-naphthol construction.

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Publication Details

Journal
Organic Letters
Published
2025-12-08
DOI
https://doi.org/10.1021/acs.orglett.5c04555
Citations
3
Primary Topic
Radical Photochemical Reactions
Type
article
Field-Weighted Citation Impact
2.81
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article

Redox-Neutral Radical Annulation of Challenging Alkynes with Aryl Sulfoxonium Ylides for 1-Naphthol Synthesis

Huaifeng Li, Nianxing Wang, Meei Mei Gui, Haiyun Huang et al.
3 citations
Organic Letters
Radical Photochemical Reactions
2.81
article

Redox-Neutral Radical Annulation of Challenging Alkynes with Aryl Sulfoxonium Ylides for 1-Naphthol Synthesis

Huaifeng Li, Nianxing Wang, Meei Mei Gui, Haiyun Huang, Yilian Lu
article en
3 citations

Abstract

This radical strategy represents the first use of sulfoxonium ylide-derived radicals in 1-naphthol synthesis and overcomes the substrate limitations of classical carbene-based methods. It enables annulation of unactivated terminal alkynes─previously challenging substrates─under mild, metal- and additive-free, visible-light conditions. Mechanistic studies support formation of a highly electrophilic hindered radical cation that undergoes polarity-inverted addition and benzannulation, establishing sulfoxonium ylides as versatile radical precursors for modular 1-naphthol construction.

Organic LettersVol. 27(50)
Qilu University of Technology (CN), Guangxi Normal University (CN)
Openalex Percentile: Top 9%
Radical Photochemical Reactions
2.81
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