Dual halogen layers diversify band engineering in Sillén oxyhalide photocatalysts: electronic structure control of SrBi <sub>3</sub> O <sub>4</sub> X <sub>3</sub> (X = Cl, Br, I) <i>via</i> halogen substitution
Halogen substitution from X = Cl to Br or I in a Sillén oxyhalide SrBi<sub>3</sub>O<sub>4</sub>X<sub>3</sub> with single/double halogen layers results in both narrower bandgaps and more negative conduction band edges for various reduction reactions. This band tuning is achieved as the two halogen layers play distinct roles in shifting the band edges, offering a new strategy for band engineering in Sillén oxyhalides.
Authors
- Hajime Suzuki (ORCID: https://orcid.org/0000-0002-8891-2033)
- Osamu Tomita (ORCID: https://orcid.org/0000-0002-5910-8732)
- Akinobu Nakada (ORCID: https://orcid.org/0000-0001-6670-5044)
- Ryu Abe (ORCID: https://orcid.org/0000-0001-8592-076X)
- Yusuke Ishii (ORCID: https://orcid.org/0000-0002-0798-8133)
Institutions
- Kyoto University (JP)
- Japan Science and Technology Agency (JP)
Publication Details
- Journal
- Physical Chemistry Chemical Physics
- Published
- 2025-11-26
- DOI
- https://doi.org/10.1039/d5cp04120a
- Primary Topic
- Electronic and Structural Properties of Oxides
- Type
- article
- Field-Weighted Citation Impact
- 0.00