Invited Article: High-quality blazed gratings through synergy between e-beam lithography and robust characterization techniques

Maintaining the highest quality and output of photon science in the VUV-, EUV-, soft-, and tender-x-ray energy ranges requires high-quality blazed profile gratings. Currently, their availability is critical due to technological challenges and limited manufacturing resources. In this work, we show the developed method for manufacturing blazed gratings relevant for synchrotron-based science by means of electron-beam lithography (EBL). We investigate different parameters influencing the optical performance of blazed profile gratings and develop a robust process for the manufacturing of high-quality blazed gratings using polymethyl methacrylate as a high resolution positive tone resist and ion beam etching. Finally, we demonstrate excellent agreement in efficiency between the produced EBL grating and the theoretical prediction.

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Publication Details

Journal
Review of Scientific Instruments
Published
2025-12-01
DOI
https://doi.org/10.1063/5.0293947
Citations
1
Primary Topic
Advanced X-ray Imaging Techniques
Type
article
Field-Weighted Citation Impact
1.88

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article

Invited Article: High-quality blazed gratings through synergy between e-beam lithography and robust characterization techniques

Christian Dávid, Nazanin Samadi, Stefan Rehbein, Analía Fernández Herrero et al.
1 citations
Review of Scientific Instruments
Advanced X-ray Imaging Techniques
1.88
article

Invited Article: High-quality blazed gratings through synergy between e-beam lithography and robust characterization techniques

Christian Dávid, Nazanin Samadi, Stefan Rehbein, Analía Fernández Herrero, Grzegorz Gwalt, Bas Ketelaars, Frank Siewert, Thomas Krist, Andréy Sokolov, A. Teichert, Christiaan Zonnevylle
article en
1 citations

Abstract

Maintaining the highest quality and output of photon science in the VUV-, EUV-, soft-, and tender-x-ray energy ranges requires high-quality blazed profile gratings. Currently, their availability is critical due to technological challenges and limited manufacturing resources. In this work, we show the developed method for manufacturing blazed gratings relevant for synchrotron-based science by means of electron-beam lithography (EBL). We investigate different parameters influencing the optical performance of blazed profile gratings and develop a robust process for the manufacturing of high-quality blazed gratings using polymethyl methacrylate as a high resolution positive tone resist and ion beam etching. Finally, we demonstrate excellent agreement in efficiency between the produced EBL grating and the theoretical prediction.

Review of Scientific InstrumentsVol. 96(12)
Physikalisch-Technische Bundesanstalt (DE), Bechtel (United States) (US), Helmholtz-Zentrum Berlin für Materialien und Energie (DE), Deutsches Elektronen-Synchrotron DESY (DE), Paul Scherrer Institute (CH), Instituto de Óptica "Daza de Valdés" (ES)
European Commission
Openalex Percentile: Top 11%
Advanced X-ray Imaging Techniques
1.88
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