Heterointerface‐Functionalized Photoelectric Response of Metal‐Oxide Schottky Photodiode for Intelligent Fire Detection
Ultraviolet photodetectors (UV-PDs) based on wide-bandgap oxide semiconductors (OSs) hold broad prospects in scientific, civil, and especially fire alarm applications. However, the hotly pursued flexible and hetero-integration capabilities are hindered by the high processing temperature of mainstream Ga<sub>2</sub>O<sub>3</sub> UV-PDs, while the selective UV detection capability of low-temperature OS (LT-OS) is undermined by the pronounced contradictory effects of abundant native defects on electric and optoelectrical properties. Herein, a heterointerface-functionalized Schottky photodiode (HF-SPD) is proposed to realize high-performance LT-OS UV-PD. Due to the sophistically modulated Schottky contact and defect distribution, ultralow dark current and remarkable photoresponse are simultaneously achieved in In<sub>2</sub>O<sub>3</sub> HF-SPDs. Under the typical 360-nm UV illumination, the responsivity (R) and detectivity (D<sup>*</sup>) respectively reach 27.75 A W<sup>-1</sup> and 2.036 × 10<sup>13</sup> Jones, enabling the early-fire-warning capability. Moreover, the HF-SPD possesses unique wavelength selectivity and bias-tunable photoelectrical characteristics. By feeding such multidimensional feature data into the multi-layer perceptron (MLP) neural network, the pattern recognition of the spectrum delivers a remarkable accuracy of 99.94%, ensuring the precise identification of combustion materials. Such an intelligent fire warning system demonstrates the prospects of algorithm-boosted LT-OS HF-SPDs in ubiquitous intelligent systems, such as wearable photodetection and in-sensor computing (ISC) devices.
Authors
- Yuyang Cai (ORCID: https://orcid.org/0009-0001-4753-5374)
- Dawei Zheng (ORCID: https://orcid.org/0000-0001-8039-334X)
- Yucheng Cao
- Yen‐Hung Lin (ORCID: https://orcid.org/0000-0001-8153-1441)
- Hoi Sing Kwok (ORCID: https://orcid.org/0000-0002-2820-9530)
- Kuan‐Chang Chang (ORCID: https://orcid.org/0000-0001-5056-0047)
- Tengyan Huang (ORCID: https://orcid.org/0000-0001-8217-0852)
- Fion Sze Yan Yeung (ORCID: https://orcid.org/0000-0003-3521-3404)
- Jie Chen (ORCID: https://orcid.org/0000-0001-5353-1110)
- Yuhan Zhang (ORCID: https://orcid.org/0000-0003-1674-1658)
- Zhiwei Zheng
- Zhineng Zhong (ORCID: https://orcid.org/0009-0007-2490-5671)
- Yufeng Jin (ORCID: https://orcid.org/0009-0006-9750-4599)
- Lei Lü (ORCID: https://orcid.org/0000-0001-5275-2181)
Institutions
- Hong Kong University of Science and Technology (HK)
- Peking University (CN)
- University of Hong Kong (HK)
Publication Details
- Journal
- Advanced Science
- Published
- 2025-12-03
- DOI
- https://doi.org/10.1002/advs.202519318
- Primary Topic
- Ga2O3 and related materials
- Type
- article
- Field-Weighted Citation Impact
- 0.00