Nonvolatile bidirectional photoresponse in a fully CMOS-compatible FeFET for in-sensor computing

While bipolar phototransistors show promise for in-sensor computing, their incompatibility with standard complementary metal–oxide–semiconductor (CMOS) technology has hindered practical integration. In this work, we demonstrate nonvolatile bidirectional photoresponse using a fully CMOS-compatible metal–ferroelectric–metal–insulator–semiconductor ferroelectric field effect transistor with Hf0.5Zr0.5O2 and IGZO materials. The key lies in a floating gate-based ferroelectric-tunable band alignment mechanism, achieving nonvolatile bipolar photoconductive states while reducing write power by two orders of magnitude. Furthermore, high-performance image processing tasks, including image sharpening, edge detection, and motion detection, are implemented using the device. This work presents a promising approach to CMOS-compatible hardware design for future in-sensor computing systems.

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Publication Details

Journal
Applied Physics Letters
Published
2025-12-01
DOI
https://doi.org/10.1063/5.0299857
Primary Topic
Ferroelectric and Negative Capacitance Devices
Type
article
Field-Weighted Citation Impact
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article

Nonvolatile bidirectional photoresponse in a fully CMOS-compatible FeFET for in-sensor computing

Xinrui Ma, Zhiyu Lin, Yuyan Fan, Tianning Cui et al.
Applied Physics Letters
Ferroelectric and Negative Capacitance Devices
article

Nonvolatile bidirectional photoresponse in a fully CMOS-compatible FeFET for in-sensor computing

Xinrui Ma, Zhiyu Lin, Yuyan Fan, Tianning Cui, Mengwei Si, Bobo Tian, Gang Liu, Danyang Chen, Xiuyan Li, Wei Li, Jianquan Liu, Jingquan Liu
article en

Abstract

While bipolar phototransistors show promise for in-sensor computing, their incompatibility with standard complementary metal–oxide–semiconductor (CMOS) technology has hindered practical integration. In this work, we demonstrate nonvolatile bidirectional photoresponse using a fully CMOS-compatible metal–ferroelectric–metal–insulator–semiconductor ferroelectric field effect transistor with Hf0.5Zr0.5O2 and IGZO materials. The key lies in a floating gate-based ferroelectric-tunable band alignment mechanism, achieving nonvolatile bipolar photoconductive states while reducing write power by two orders of magnitude. Furthermore, high-performance image processing tasks, including image sharpening, edge detection, and motion detection, are implemented using the device. This work presents a promising approach to CMOS-compatible hardware design for future in-sensor computing systems.

Applied Physics LettersVol. 127(22)
Sun Yat-sen University (CN), Shanghai Jiao Tong University (CN), East China Normal University (CN)
Openalex Percentile: Top 62%
Ferroelectric and Negative Capacitance Devices
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