Epitaxial Cr2MnO4 p–n heterojunction to (2¯01) β-Ga2O3 deposited via off-axis magnetron sputtering

We report the heteroepitaxial growth of spinel Cr2MnO4 thin films on (2¯01) β-Ga2O3 substrates via off-axis RF magnetron sputtering. Structural analysis confirms (111)-oriented epitaxial films with optimized growth at 950 °C. Fabricated Cr2MnO4/β-Ga2O3 vertical diodes exhibit rectifying behavior with high on/off ratios (∼108), turn-on voltages near 0.85 V, and low reverse leakage current. Transmission electron microscopy and atomic force microscopy analyses show the films exhibit a Stranski–Krastanov growth mode, with three-dimensional texturing of potential interest for device performance. Capacitance–voltage measurements reveal intrinsic p-type conductivity with carrier concentration ∼7 × 1017 cm−3. The results suggest that Cr2MnO4 may be a promising candidate for Ga2O3-based bipolar devices.

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Publication Details

Journal
Journal of Applied Physics
Published
2025-12-02
DOI
https://doi.org/10.1063/5.0299530
Citations
1
Primary Topic
Ga2O3 and related materials
Type
article
Field-Weighted Citation Impact
0.43
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article

Epitaxial Cr2MnO4 p–n heterojunction to (2¯01) β-Ga2O3 deposited via off-axis magnetron sputtering

Karl D. Hobart, Marko J. Tadjer, James C. Gallagher, Gaurab Rimal et al.
1 citations
Journal of Applied Physics
Ga2O3 and related materials
0.43
article

Epitaxial Cr2MnO4 p–n heterojunction to (2¯01) β-Ga2O3 deposited via off-axis magnetron sputtering

Karl D. Hobart, Marko J. Tadjer, James C. Gallagher, Gaurab Rimal, Kashmira Dey, Babajide Akintunde, Adam J. Hauser, Michael A. Mastro, Daniel J. Pennachio, Katie R. Gann, Audrey Rose Gutierrez, A. Kayani, Naomi Derksen, Xin Wang, Michael G. Hall, Ashik Imran, Jared T. Orent
article en
1 citations

Abstract

We report the heteroepitaxial growth of spinel Cr2MnO4 thin films on (2¯01) β-Ga2O3 substrates via off-axis RF magnetron sputtering. Structural analysis confirms (111)-oriented epitaxial films with optimized growth at 950 °C. Fabricated Cr2MnO4/β-Ga2O3 vertical diodes exhibit rectifying behavior with high on/off ratios (∼108), turn-on voltages near 0.85 V, and low reverse leakage current. Transmission electron microscopy and atomic force microscopy analyses show the films exhibit a Stranski–Krastanov growth mode, with three-dimensional texturing of potential interest for device performance. Capacitance–voltage measurements reveal intrinsic p-type conductivity with carrier concentration ∼7 × 1017 cm−3. The results suggest that Cr2MnO4 may be a promising candidate for Ga2O3-based bipolar devices.

Journal of Applied PhysicsVol. 138(21)
United States Naval Research Laboratory (US), Western Michigan University (US), University of Alabama (US), National Research Council (RO), National Health Council (US)
Openalex Percentile: Top 33%
Ga2O3 and related materials
0.43
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