Comparative Study of Voltage Amplification in Cylindrical FE-FE-DE and FE-DE Heterostructures
This work examines a cylindrical FE-DE heterostructure and compares its performance with that of a cylindrical FE-FE-DE heterostructure. It aims to maximize voltage amplification, increase capacitance, and attain a constant negative capacitance. First, the existence of negative capacitance is shown by analyzing isolated cylindrical ferroelectric capacitors. A cylindrical dielectric capacitor and a cylindrical ferroelectric capacitor are integrated in series to stabilize negative capacitance. Our results indicate that the capacitance of the FE-FE-DE stack, consisting of Si:HfO2 and Zr:HfO2, closely aligns with the dielectric capacitance. Consequently, enhanced performance is anticipated in comparison with the FE-DE arrangement. Additionally, the dynamic response of two distinct configurations was analyzed, yielding a comprehensive understanding of these heterostructures’ behavior.
Authors
- Pramod Martha (ORCID: https://orcid.org/0000-0002-0889-0525)
- Bhaskar Awadhiya (ORCID: https://orcid.org/0000-0002-4784-6172)
- P. Suresh (ORCID: https://orcid.org/0000-0001-6251-8102)
- Yashwanth Nanjappa (ORCID: https://orcid.org/0000-0002-4063-0790)
- Vikash Mishra (ORCID: https://orcid.org/0000-0002-2089-8415)
- Sampath Kumar (ORCID: https://orcid.org/0000-0002-8281-2410)
Institutions
- Manipal Academy of Higher Education (IN)
Publication Details
- Journal
- Electronic Materials
- Published
- 2025-12-01
- DOI
- https://doi.org/10.3390/electronicmat6040021
- Primary Topic
- Ferroelectric and Negative Capacitance Devices
- Type
- article
- Field-Weighted Citation Impact
- 0.00