Unusual Electrochemical Activity of Thin SiO <sub>2</sub> Layers Leads to Instability of Molecular Attachment in Hybrid Photoelectrodes

Hybrid photoelectrodes, comprised of a light-absorbing semiconductor and a surface-integrated molecular catalyst, are attractive for applications in artificial photosynthesis, since they combine the advantages of broadband semiconductor light absorption with the selectivity of molecular catalysis. A widely used class of hybrid photoelectrodes is based on Si substrates passivated by a thin (<3 nm) layer of silicon oxide, which is commonly prepared by controlled chemical or thermal oxidation, resulting in chemical oxide (ChO) or thermal oxide (ThO) layers, respectively. However, the electrochemical stability of these oxide layers, and the chemical stability of the semiconductor-molecule assembly in hybrid photoelectrodes, are not well understood, with evidence that covalently bound molecules detach from the oxide surface upon application of cathodic bias. We have examined the intrinsic electrochemical reactivity of silicon oxide layers and how it affects the attachment of molecular monolayers. We determined that the surface of Si|ThO is primarily terminated with hydrophobic siloxane moieties, whereas that of Si|ChO contains a higher concentration of hydrophilic silanol groups. Initial high current densities for Si|ChO under applied bias up to −2 V vs Ag/AgCl, decrease during repeated cyclic voltammetry scans, due to the consumption of surface-bound water. This is manifested by a reversible wave around −0.5 V in CH3CN solution, and a similar pH-dependent wave in water, revealing the pKa of the silanol groups to be ∼4. Our combined observations support the electrochemically induced dehydration of the SiO2 surface, which converts silanol groups to siloxanes and proceeds through an H atom intermediate that is most likely stabilized by pentavalent Si. We propose that similar reactivity is responsible for the electrochemical loss of alkylsiloxane-attached molecules under cathodic bias, which has important implications for the choice of catalyst attachment strategy in hybrid photoelectrodes.

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Journal
ACS Applied Energy Materials
Published
2025-12-01
DOI
https://doi.org/10.1021/acsaem.5c03010
Primary Topic
TiO2 Photocatalysis and Solar Cells
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article
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article

Unusual Electrochemical Activity of Thin SiO 2 Layers Leads to Instability of Molecular Attachment in Hybrid Photoelectrodes

David C. Grills, Manushree Tanwar, Chiara Cappuccino, Gerald F. Manbeck et al.
ACS Applied Energy Materials
TiO2 Photocatalysis and Solar Cells
article

Unusual Electrochemical Activity of Thin SiO 2 Layers Leads to Instability of Molecular Attachment in Hybrid Photoelectrodes

David C. Grills, Manushree Tanwar, Chiara Cappuccino, Gerald F. Manbeck, Nilay Hazari, Xiaofan Jia, Carrie L. Donley, Dmitry E. Polyansky, Zahra Fakhraai
article en

Abstract

Hybrid photoelectrodes, comprised of a light-absorbing semiconductor and a surface-integrated molecular catalyst, are attractive for applications in artificial photosynthesis, since they combine the advantages of broadband semiconductor light absorption with the selectivity of molecular catalysis. A widely used class of hybrid photoelectrodes is based on Si substrates passivated by a thin (<3 nm) layer of silicon oxide, which is commonly prepared by controlled chemical or thermal oxidation, resulting in chemical oxide (ChO) or thermal oxide (ThO) layers, respectively. However, the electrochemical stability of these oxide layers, and the chemical stability of the semiconductor-molecule assembly in hybrid photoelectrodes, are not well understood, with evidence that covalently bound molecules detach from the oxide surface upon application of cathodic bias. We have examined the intrinsic electrochemical reactivity of silicon oxide layers and how it affects the attachment of molecular monolayers. We determined that the surface of Si|ThO is primarily terminated with hydrophobic siloxane moieties, whereas that of Si|ChO contains a higher concentration of hydrophilic silanol groups. Initial high current densities for Si|ChO under applied bias up to −2 V vs Ag/AgCl, decrease during repeated cyclic voltammetry scans, due to the consumption of surface-bound water. This is manifested by a reversible wave around −0.5 V in CH3CN solution, and a similar pH-dependent wave in water, revealing the pKa of the silanol groups to be ∼4. Our combined observations support the electrochemically induced dehydration of the SiO2 surface, which converts silanol groups to siloxanes and proceeds through an H atom intermediate that is most likely stabilized by pentavalent Si. We propose that similar reactivity is responsible for the electrochemical loss of alkylsiloxane-attached molecules under cathodic bias, which has important implications for the choice of catalyst attachment strategy in hybrid photoelectrodes.

ACS Applied Energy MaterialsVol. 8(24)
University of North Carolina at Chapel Hill (US), Brookhaven National Laboratory (US), Yale University (US), California University of Pennsylvania (US), Division of Chemistry (US)
Openalex Percentile: Top 73%
TiO2 Photocatalysis and Solar Cells
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