Polarization-insensitive electro-optic modulator based on thin-film lithium niobate multimode waveguide
We demonstrate a polarization-insensitive electro-optic (EO) modulator based on x-cut thin-film lithium niobate (TFLN), employing capacitively loaded traveling-wave (CLTW) electrodes on an undercut-etched silicon substrate. By converting the TM0 mode into a higher-order TE1 mode via adiabatic mode converters and modulating both TE0 and TE1 modes simultaneously in a multimode Mach–Zehnder interferometer, polarization-insensitive modulation is achieved without duplicating modulators or control circuits. The fabricated device exhibits a polarization-dependent loss (PDL) of 2.2 dB, a modulation efficiency of VπL = 3.12 V cm, and a 3-dB EO bandwidth of 43 GHz for both modes. High-speed data transmission is experimentally verified with clear eye diagrams up to 100 Gb/s (OOK) and 112 Gb/s (PAM-4) for both polarizations. These results highlight the feasibility of dual-mode modulation for polarization-insensitive interconnects and support its potential for deployment in co-packaged optics (CPO) and remote external light sources related transmitter systems.
Authors
- Ao Cui
- Changjian Guo (ORCID: https://orcid.org/0000-0002-8079-460X)
- Qi Lu (ORCID: https://orcid.org/0000-0003-1035-530X)
- Haohua Wang (ORCID: https://orcid.org/0009-0003-7530-8122)
- Ziliang Ruan (ORCID: https://orcid.org/0000-0002-6633-6514)
- Wang Zong (ORCID: https://orcid.org/0000-0002-9938-0036)
- Liu Liu (ORCID: https://orcid.org/0000-0002-3651-544X)
- Kaixuan Chen (ORCID: https://orcid.org/0000-0002-2538-6793)
Institutions
- South China Normal University (CN)
- Wuhan National Laboratory for Optoelectronics (CN)
- RIKEN Center for Advanced Photonics (JP)
- Huazhong University of Science and Technology (CN)
Publication Details
- Journal
- APL Photonics
- Published
- 2025-12-01
- DOI
- https://doi.org/10.1063/5.0289772
- Citations
- 1
- Primary Topic
- Photorefractive and Nonlinear Optics
- Type
- article
- Field-Weighted Citation Impact
- 1.25