HfSe2(1-X)Te2X alloy channel transistor with semimetal HfTe2 contact electrodes

We have demonstrated series ternary HfSe2(1-x)Te2x single crystalline alloys can be synthesized by a general chemical vapor transport approach. These alloys were verified to exhibit composition-dependent bandgap tunability (from 1.1 to 0 eV) by growth process control. Such characteristic offers a feasible way to construct HfSe2(1-x)Te2x alloy channel transistors using Dirac semimetal HfTe2 as contact electrodes, which shows negligible Schottky barrier height. Notably, the HfSe1.8Te0.2 channel transistor with a channel length of 9.48 μm on a 14 nm h-BN dielectric achieves a balance performance with current Ion/Ioff ratio of 9.5 × 104 and an Ion of 0.828 μA/μm. The current investigation of alloy engineering offers a feasible way of developing high-performance HfSe2-based beyond-silicon electronics.

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Publication Details

Journal
Applied Physics Letters
Published
2025-12-01
DOI
https://doi.org/10.1063/5.0303831
Primary Topic
2D Materials and Applications
Type
article
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article

HfSe2(1-X)Te2X alloy channel transistor with semimetal HfTe2 contact electrodes

Y. H. Wang, Haixin Chang, Shiwan Zou, Boyuan Di et al.
Applied Physics Letters
2D Materials and Applications
article

HfSe2(1-X)Te2X alloy channel transistor with semimetal HfTe2 contact electrodes

Y. H. Wang, Haixin Chang, Shiwan Zou, Boyuan Di, Jie Yu, Jintian Li, Shijie Liu, Wenfeng Zhang, Yuying Jiang, Liqiang Chen, Ziyi Dong
article en

Abstract

We have demonstrated series ternary HfSe2(1-x)Te2x single crystalline alloys can be synthesized by a general chemical vapor transport approach. These alloys were verified to exhibit composition-dependent bandgap tunability (from 1.1 to 0 eV) by growth process control. Such characteristic offers a feasible way to construct HfSe2(1-x)Te2x alloy channel transistors using Dirac semimetal HfTe2 as contact electrodes, which shows negligible Schottky barrier height. Notably, the HfSe1.8Te0.2 channel transistor with a channel length of 9.48 μm on a 14 nm h-BN dielectric achieves a balance performance with current Ion/Ioff ratio of 9.5 × 104 and an Ion of 0.828 μA/μm. The current investigation of alloy engineering offers a feasible way of developing high-performance HfSe2-based beyond-silicon electronics.

Applied Physics LettersVol. 127(22)
Division of Materials Science and Engineering (AU), Huazhong University of Science and Technology (CN)
Openalex Percentile: Top 69%
2D Materials and Applications
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HfSe2(1-X)Te2X alloy channel transistor with semimetal HfTe2 contact electrodes — Y. H. Wang, Haixin Chang, et al. · Applied Physics Letters (2025) | TGRS Research Map | TGRS