Variability characteristics of non-stoichiometric, low-cost silicon oxide resistive memory
Resistive-switching random access memory (RRAM) is an important class of data storage and computing devices. A recent technological trend requires RRAM devices to be manufactured in an environmentally and economically sound way. Here, we designed and developed the non-stoichiometric resistive-switching memory device (Ti/SiOx/TiNx) that entirely consists of bio-compatible, non-toxic, and inexpensive materials by using the simple microfabrication techniques. In view of the strong demand for memories that can be co-located with or embedded in computation elements (for memory-centric or non-von Neumann computing hardware), we thoroughly characterized the non-stoichiometric, low-cost silicon oxide RRAM device in terms of both cycle-to-cycle and device-to-device variabilities. Our device features variability characteristics comparable to the state-of-the-art RRAM device based on metal oxides and other complex heterostructures. Intermediate resistance states were also straightforwardly obtained by applying relatively high compliance currents.
Authors
- José Sánchez del Río Sáez (ORCID: https://orcid.org/0000-0003-2243-8452)
- Chiyui Ahn (ORCID: https://orcid.org/0000-0002-0807-2071)
- J.N. Rodrigues (ORCID: https://orcid.org/0009-0003-5548-4225)
- Pranav U. Choori
- Fitunerediate G. Gebeyehu
Institutions
- George Mason University (US)
- William & Mary (US)
- Universidad Politécnica de Madrid (ES)
Publication Details
- Journal
- AIP Advances
- Published
- 2025-12-01
- DOI
- https://doi.org/10.1063/5.0300195
- Primary Topic
- Advanced Memory and Neural Computing
- Type
- article
- Field-Weighted Citation Impact
- 0.00