Effects of lamella preparation on InGaN quantum well luminescence

Despite it being a popular sample preparation technique, the optoelectronic effects of thinning bulk samples into lamella using a Ga-based focused ion beam (FIB), as is commonly performed for studies in a transmission electron microscope, have been seldom studied systematically. In this work, we confront this using correlative cathodoluminescence spectroscopy to investigate the optical properties of high In content c-plane InGaN/GaN quantum wells (QWs), fabricated including a growth-interrupting step that forms regions of quantum disk InGaN islands that behave as localized emitters and, furthermore, reduce the strain-induced quantum Stark effect present in the majority of such heterostructures. Using picosecond electrostatically beam-blanked electron pulses, we measured the decay transients as a function of position and wavelength. The sample was studied before and after undergoing preparation as a lamella, demonstrating that FIB preparation affects both the spectral and temporal luminescence properties despite measures undertaken to protect the sample during fabrication. Non-radiative defects introduced by the ion beam quenched the luminescence as well as reduced the lifetime of emission, with the QW luminescence component particularly affected due to the emission being weakly localized and hence allowing carriers to migrate to defect areas. These findings underscore the importance of correlating bulk and lamella properties to accurately interpret optical measurements.

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Publication Details

Journal
Applied Physics Letters
Published
2025-12-01
DOI
https://doi.org/10.1063/5.0283025
Primary Topic
GaN-based semiconductor devices and materials
Type
article
Field-Weighted Citation Impact
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article

Effects of lamella preparation on InGaN quantum well luminescence

Teresa Hungrı́a, Sophie Meuret, A. F. Tsatsul’nikov, Luiz H. G. Tizei et al.
Applied Physics Letters
GaN-based semiconductor devices and materials
article

Effects of lamella preparation on InGaN quantum well luminescence

Teresa Hungrı́a, Sophie Meuret, A. F. Tsatsul’nikov, Luiz H. G. Tizei, A. Balocchi, A. E. Nikolaev, Albert Polman, Delphine Lagarde, Florian Castioni, Claudia Santini, N. Cherkashin, Nika van Nielen, Robin Cours, A. V. Sakharov
article en

Abstract

Despite it being a popular sample preparation technique, the optoelectronic effects of thinning bulk samples into lamella using a Ga-based focused ion beam (FIB), as is commonly performed for studies in a transmission electron microscope, have been seldom studied systematically. In this work, we confront this using correlative cathodoluminescence spectroscopy to investigate the optical properties of high In content c-plane InGaN/GaN quantum wells (QWs), fabricated including a growth-interrupting step that forms regions of quantum disk InGaN islands that behave as localized emitters and, furthermore, reduce the strain-induced quantum Stark effect present in the majority of such heterostructures. Using picosecond electrostatically beam-blanked electron pulses, we measured the decay transients as a function of position and wavelength. The sample was studied before and after undergoing preparation as a lamella, demonstrating that FIB preparation affects both the spectral and temporal luminescence properties despite measures undertaken to protect the sample during fabrication. Non-radiative defects introduced by the ion beam quenched the luminescence as well as reduced the lifetime of emission, with the QW luminescence component particularly affected due to the emission being weakly localized and hence allowing carriers to migrate to defect areas. These findings underscore the importance of correlating bulk and lamella properties to accurately interpret optical measurements.

Applied Physics LettersVol. 127(22)
Centre National de la Recherche Scientifique (FR), Université Fédérale de Toulouse Midi-Pyrénées (FR), Université Paris-Saclay (FR), Laboratoire de physique des Solides (FR), Institute for Atomic and Molecular Physics (NL), Space Micro (United States) (US), Ioffe Institute (RU)
Openalex Percentile: Top 76%
GaN-based semiconductor devices and materials
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