A Top Floating Gate Heterojunction Structure for Integrated Photoelectric Computing and Low Voltage Memory
Multifunctional optoelectronic devices integrating sensing, computing, and memory hold significant implications for the advancement of high-density integrated systems and intelligent information processing. In this study, we propose a top floating-gate heterojunction field-effect transistor (TFG-HJFET) based on a MoS2/Ge heterojunction. This device exhibits positive photoconductivity under visible light and negative photoconductivity under near-infrared (NIR) light, respectively, enabling the composite functions of wide-spectrum fast sensing, high-integration computing, and low-power memory. For the computing function, we leverage the gate electric field and visible/NIR light modulation to enable the single TFG-HJFET to implement five basic logic operations as well as complex logic operations. Compared with traditional CMOS-based systems, this single-device design reduces transistor count by 50–97.5%. To further validate its practicality, we constructed an 8-bit parallel array, which verified the device’s feasibility for image edge detection and reversible encryption/decryption. In terms of memory performance, the TFG-HJFET achieves stable memory with an equivalent on–off ratio using only 1/3 of the gate voltage pulse required by conventional floating-gate structures, and no performance degradation is observed over a short period. Additionally, controlling the gate voltage enables distinguishable two-bit memory, which reduces the memory cell requirement per character by 50%. These results demonstrate that this integrated sensing-computing-memory design provides opportunities for the development of high-performance intelligent information processing systems, holding broad prospects in real-time image processing, secure communication, and information memory.
Authors
- Jin‐Ping Ao (ORCID: https://orcid.org/0000-0003-1685-0168)
- Fengqiu Jiang
- Tao Liu (ORCID: https://orcid.org/0000-0003-4103-9422)
- Liming Wang (ORCID: https://orcid.org/0000-0001-5751-5126)
- Zhiwei Chen (ORCID: https://orcid.org/0000-0002-7242-2662)
- Jie You (ORCID: https://orcid.org/0009-0005-2977-8961)
- Xiao Xia Wang (ORCID: https://orcid.org/0000-0003-2840-7470)
- Zhangcheng Liu (ORCID: https://orcid.org/0009-0002-5809-4137)
- Yiqing Cao (ORCID: https://orcid.org/0000-0002-0955-0442)
- Haozhe Zhang (ORCID: https://orcid.org/0000-0001-6363-5271)
- Qingguo Xu
- Kuanxin Chen
- Yang Li (ORCID: https://orcid.org/0000-0003-4616-4230)
Institutions
- Jiangnan University (CN)
- Analog Devices (United States) (US)
- Xidian University (CN)
- Tianjin Academy of Fine Arts (CN)
- Universidad Nacional Experimental de las Artes (VE)
Publication Details
- Journal
- ACS Applied Electronic Materials
- Published
- 2025-12-01
- DOI
- https://doi.org/10.1021/acsaelm.5c02258
- Primary Topic
- Transition Metal Oxide Nanomaterials
- Type
- article
- Field-Weighted Citation Impact
- 0.00