A surface acoustic wave tag utilizing a multilayer structure of SiO2/Pt/128°YX-LiNbO3 for operation at 600 °C

This study addresses the issue of traditional surface acoustic wave (SAW) tag failure under high-temperature conditions by proposing a SAW tag based on a multilayer structure of SiO<sub>2</sub>/Pt/128°YX-LiNbO<sub>3</sub>. The structure has been simulated using the finite element method/wave-number domain analysis (FEM/WDA) approach, which reveal the effects of reflector topological parameters on the scattering characteristics of SAWs. Compared with Pt/128°YX-LiNbO<sub>3</sub>, the bulk wave scattering in the multilayer structure is reduced by 50%. In the micro-nanofabrication of the tag, a low-roughness, high-density SiO<sub>2</sub> film is prepared using physical vapor deposition (PVD). Test results indicate that the tag exhibits a temperature coefficient of frequency (TCF) of -32.38 ppm/°C over a wide temperature range of 30-600°C. After undergoing thermal shock at 600 °C for 336 h, the time-domain reflection amplitude decreases by less than 1%, demonstrating that the SiO<sub>2</sub> protective layer effectively suppresses the high-temperature decomposition of LiNbO<sub>3</sub> and reduces the agglomeration rate of Pt electrodes. Experimental results confirm that the proposed high-temperature-resistant SAW tag maintains stable performance under prolonged exposure to 600 °C environments. The tag has been installed on the surface of a steel ladle in a steel plant, demonstrating excellent reliability in a vacuum degassing environment.

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Publication Details

Journal
Microsystems & Nanoengineering
Published
2025-12-01
DOI
https://doi.org/10.1038/s41378-025-01084-1
Primary Topic
Acoustic Wave Resonator Technologies
Type
article
Field-Weighted Citation Impact
0.00

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article

A surface acoustic wave tag utilizing a multilayer structure of SiO2/Pt/128°YX-LiNbO3 for operation at 600 °C

Chengtao Luo, Ruchuan Shi, Tao Han, Hualin Li et al.
Microsystems & Nanoengineering
Acoustic Wave Resonator Technologies
article

A surface acoustic wave tag utilizing a multilayer structure of SiO2/Pt/128°YX-LiNbO3 for operation at 600 °C

Chengtao Luo, Ruchuan Shi, Tao Han, Hualin Li, Dapeng Guo, Zhengkai Tang
article en

Abstract

This study addresses the issue of traditional surface acoustic wave (SAW) tag failure under high-temperature conditions by proposing a SAW tag based on a multilayer structure of SiO<sub>2</sub>/Pt/128°YX-LiNbO<sub>3</sub>. The structure has been simulated using the finite element method/wave-number domain analysis (FEM/WDA) approach, which reveal the effects of reflector topological parameters on the scattering characteristics of SAWs. Compared with Pt/128°YX-LiNbO<sub>3</sub>, the bulk wave scattering in the multilayer structure is reduced by 50%. In the micro-nanofabrication of the tag, a low-roughness, high-density SiO<sub>2</sub> film is prepared using physical vapor deposition (PVD). Test results indicate that the tag exhibits a temperature coefficient of frequency (TCF) of -32.38 ppm/°C over a wide temperature range of 30-600°C. After undergoing thermal shock at 600 °C for 336 h, the time-domain reflection amplitude decreases by less than 1%, demonstrating that the SiO<sub>2</sub> protective layer effectively suppresses the high-temperature decomposition of LiNbO<sub>3</sub> and reduces the agglomeration rate of Pt electrodes. Experimental results confirm that the proposed high-temperature-resistant SAW tag maintains stable performance under prolonged exposure to 600 °C environments. The tag has been installed on the surface of a steel ladle in a steel plant, demonstrating excellent reliability in a vacuum degassing environment.

Microsystems & NanoengineeringVol. 11(1)
Shanghai Jiao Tong University (CN), China Electronics Technology Group Corporation (CN)
National Natural Science Foundation of China
Openalex Percentile: Top 63%
Acoustic Wave Resonator Technologies
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A surface acoustic wave tag utilizing a multilayer structure of SiO2/Pt/128°YX-LiNbO3 for operation at 600 °C — Chengtao Luo, Ruchuan Shi, et al. · Microsystems & Nanoengineering (2025) | TGRS Research Map | TGRS