Fabrication of High-Resolution Active Matrix Micro-LED Display Based on Direct Laser Mass Transfer

Mass transfer technology represents a critical bottleneck limiting the mass production of large-sized micro-LED displays. This study proposes a high-resolution direct laser mass transfer process utilizing a receiving tape, successfully fabricating a 3.8 in. 1280 × 1024 green active matrix micro-LED display with 431 PPI and 58.88 μm pixel pitch. The receiving tape with excellent adhesion, high-temperature fluidity, and chip-catching capability was prepared via anionic polymerization and a comma scraping roller process. The micro-LED chips were directly transferred from the chips on the wafer (CoW) to the thin-film transistor (TFT) backplane using a 248 nm KrF excimer laser, significantly simplifying the transfer process. Combined with a flexible laminated bonding structure, high-precision transfer and high-yield thermocompression bonding of the micro-LED array to the TFT backplane were achieved, achieving an illumination yield of 99.39%. Comprehensive analyses were conducted on the morphology of the transferred chips, the bonding interface of the bonded chips, and the key optical performance parameters. The process developed herein provides a scalable solution for the large-scale manufacturing of micro-LED displays, holding significant potential to accelerate the commercialization of micro-LED technology.

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Publication Details

Journal
ACS Photonics
Published
2025-11-30
DOI
https://doi.org/10.1021/acsphotonics.5c01743
Citations
1
Primary Topic
Advanced optical system design
Type
article
Field-Weighted Citation Impact
0.67
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Fabrication of High-Resolution Active Matrix Micro-LED Display Based on Direct Laser Mass Transfer

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Fabrication of High-Resolution Active Matrix Micro-LED Display Based on Direct Laser Mass Transfer

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article en
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Abstract

Mass transfer technology represents a critical bottleneck limiting the mass production of large-sized micro-LED displays. This study proposes a high-resolution direct laser mass transfer process utilizing a receiving tape, successfully fabricating a 3.8 in. 1280 × 1024 green active matrix micro-LED display with 431 PPI and 58.88 μm pixel pitch. The receiving tape with excellent adhesion, high-temperature fluidity, and chip-catching capability was prepared via anionic polymerization and a comma scraping roller process. The micro-LED chips were directly transferred from the chips on the wafer (CoW) to the thin-film transistor (TFT) backplane using a 248 nm KrF excimer laser, significantly simplifying the transfer process. Combined with a flexible laminated bonding structure, high-precision transfer and high-yield thermocompression bonding of the micro-LED array to the TFT backplane were achieved, achieving an illumination yield of 99.39%. Comprehensive analyses were conducted on the morphology of the transferred chips, the bonding interface of the bonded chips, and the key optical performance parameters. The process developed herein provides a scalable solution for the large-scale manufacturing of micro-LED displays, holding significant potential to accelerate the commercialization of micro-LED technology.

ACS PhotonicsVol. 12(12)
Shanghai University (CN), BOE Technology Group (China) (CN), Tea Research Institute (CN)
Openalex Percentile: Top 24%
Advanced optical system design
0.67
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