Interface-mediated softening and deformation mechanics in amorphous/amorphous nanolaminates

Interfaces govern the unique mechanical response of amorphous multilayers. Here, we examine nanoindentation hardness and deformation behaviour of amorphous/amorphous Ta 2 O 5 /SiO 2 nanolaminates with bilayer thickness ranging from 2 nm to 334 nm. While monolithic SiO 2 exhibits catastrophic failure through a single dominant shear band, multilayer architectures demonstrate varied deformation mechanisms. Hardness decreases with reduced bilayer thickness, from 7.7 GPa at 334 nm to 5.5 GPa at 2 nm spacing, contrasting with crystalline systems, which strengthen with decreasing spacing. Cross-sectional transmission electron microscopy reveals that fine bilayer thickness promotes closely spaced vertical shear bands accompanied by bilayer compression, while coarser spacings show fewer, widely spaced shear bands with chemical intermixing. Scanning precession electron diffraction mapping demonstrates significant densification beneath indents. The high interface density facilitates strain accommodation that prevents catastrophic failure typical of brittle amorphous materials.

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Journal
Scripta Materialia
Published
2025-11-29
DOI
https://doi.org/10.1016/j.scriptamat.2025.117118
Primary Topic
Advanced Surface Polishing Techniques
Type
article
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article

Interface-mediated softening and deformation mechanics in amorphous/amorphous nanolaminates

Silvia Schwyn Thöny, Vivek Devulapalli, Stephan Waldner, Manuel Bärtschi et al.
Scripta Materialia
Advanced Surface Polishing Techniques
article

Interface-mediated softening and deformation mechanics in amorphous/amorphous nanolaminates

Silvia Schwyn Thöny, Vivek Devulapalli, Stephan Waldner, Manuel Bärtschi, Xavier Maeder, Fedor F. Klimashin, Johann Michler
article en

Abstract

Interfaces govern the unique mechanical response of amorphous multilayers. Here, we examine nanoindentation hardness and deformation behaviour of amorphous/amorphous Ta 2 O 5 /SiO 2 nanolaminates with bilayer thickness ranging from 2 nm to 334 nm. While monolithic SiO 2 exhibits catastrophic failure through a single dominant shear band, multilayer architectures demonstrate varied deformation mechanisms. Hardness decreases with reduced bilayer thickness, from 7.7 GPa at 334 nm to 5.5 GPa at 2 nm spacing, contrasting with crystalline systems, which strengthen with decreasing spacing. Cross-sectional transmission electron microscopy reveals that fine bilayer thickness promotes closely spaced vertical shear bands accompanied by bilayer compression, while coarser spacings show fewer, widely spaced shear bands with chemical intermixing. Scanning precession electron diffraction mapping demonstrates significant densification beneath indents. The high interface density facilitates strain accommodation that prevents catastrophic failure typical of brittle amorphous materials.

Scripta MaterialiaVol. 273
Oerlikon (Switzerland) (CH), RhySearch (Switzerland) (CH), École Polytechnique Fédérale de Lausanne (CH), Swiss Federal Laboratories for Materials Science and Technology (CH)
Openalex Percentile: Top 63%
Advanced Surface Polishing Techniques
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Interface-mediated softening and deformation mechanics in amorphous/amorphous nanolaminates — Silvia Schwyn Thöny, Vivek Devulapalli, et al. · Scripta Materialia (2025) | TGRS Research Map | TGRS