HV Pulse Generator with Short Triggering Delay for Impact Ionization Triggering
We propose a fast pulse generator for Impact Ionization (II) triggering based on COTS components: ultra-boosted HV SiC MOS transistor stage as a driver of a fast Marx Generator with small thyristors triggered in II mode. Our gate boosting driver provides up to <tex xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">$>600 ~\mathrm{V}$</tex> output voltage with <tex xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">$> 1 \text{kV} / \text{ns}$</tex> slew rate and is capable to deliver up to <tex xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">$>60 ~\mathrm{A}$</tex> peak current. 2 kV rated SiC MOSFETs with such aggressive gate boosting can reach <tex xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">$>1.4 \text{kV} / \text{ns}$</tex> slew rate of its drain voltage with a lifetime acceptable for our application (<tex xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">$>6 \times 10^{7}$</tex> pulses). Our setup with five parallel SiC MOSFETs and four stage Marx generator with D2PAK thyristors triggered in II mode is generating <tex xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">$>10 \text{kV}$</tex> peak voltage with <tex xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">$>30 \text{kV} / \text{ns}$</tex> slew rate and <tex xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">$>400 ~\mathrm{A}$</tex> peak current with a triggering delay of 10 ns.
Authors
- Dimosthenis Peftitsis (ORCID: https://orcid.org/0000-0002-4041-7842)
- Viliam Senaj (ORCID: https://orcid.org/0009-0008-6260-6557)
- Thomas Krämer
- A. S. Kaufman
Institutions
- Norwegian University of Science and Technology (NO)
- European Organization for Nuclear Research (CH)
Publication Details
- Published
- 2025-06-15
- DOI
- https://doi.org/10.1109/ppps56198.2025.11248792
- Primary Topic
- Silicon Carbide Semiconductor Technologies
- Type
- article
- Field-Weighted Citation Impact
- 0.00