Atomic‐Level Insights into On‐Surface Chemistry of Organosilicon Compounds by Scanning Probe Microscopy

Organosilicon compounds (OSCs), which consist of silicon atoms bonded to organic groups, have become vital in fields such as materials science, catalysis, and electronics. Their flexibility comes from the ability to adjust their properties by attaching different organic groups to the silicon framework. Despite many progresses, a key challenge persists in controlling the structure and reactivity of these compounds, particularly on a solid surface. Scanning probe microscopy (SPM) techniques, including scanning tunneling microscopy (STM), scanning tunneling spectroscopy (STS), and atomic force microscopy (AFM), are powerful tools for studying molecular behaviors at the atomic level. These techniques enable real space imaging and precise measurements, making them invaluable for understanding OSCs. This article examines the application of STM, STS, and AFM in the on‐surface chemistry of organosilicon, with a focus on molecular adsorption, self‐assembly, surface‐driven reactions, and innovative synthesis of nanostructures. These techniques can provide valuable insights into surface reactivity, molecular organization, and the formation of nanostructures, driving the development of advanced functional materials. Further, density functional theory offers exciting opportunities for advancing surface chemistry and nanomaterial design. This article highlights the critical role of SPM in pushing forward OSCs research and enabling the development of next‐generation organosilicon nanomaterials.