Sieving Hydrogen Isotopes via Machine Learning Assisted Chemical Vapor Deposition (CVD) of High‐Quality Monolayer Hexagonal Boron Nitride (h‐BN) on Iron Foils
Atomically thin two-dimensional (2D) ceramics, such as monolayer hexagonal boron nitride (h-BN), present potential for disruptive advances in separations. However, sub-atomic scale separation of hydrogen isotopes (H<sup>+</sup>/D<sup>+</sup>) require near pristine 2D material membranes, and scalable synthesis of such high-quality h-BN comparable to mechanically exfoliated crystals remains a significant challenge. Here, we report a scalable Fe-catalyzed chemical vapor deposition (CVD) process for bottom-up synthesis of large-area, high-quality monolayer h-BN films, overcoming key limitations of conventional ammonia-based routes. By leveraging mechanistic insights and higher CVD temperatures, we suppress multilayer formation and achieve uniform monolayer h-BN coverage on commercially available Fe foils. Machine learning enables systematic exploration of the complex, multi-dimensional CVD parameter space (growth time, temperature, precursor temperature, multilayer faction, coverage), providing data-driven approaches to visualize and identify process regimes facilitating predominantly monolayer h-BN growth with minimal secondary nuclei/ad-layers. The optimized Fe-catalyzed CVD h-BN membranes show high-quality as observed by proton/deuteron (H<sup>+</sup>/D<sup>+</sup>) selectivity ≈8.45, approaching the highest quality benchmark of mechanically exfoliated h-BN (H<sup>+</sup>/D<sup>+</sup> selectivity ≈10) as well as significantly outperforming Cu-catalyzed CVD h-BN membranes (H<sup>+</sup>/D<sup>+</sup> selectivity ≈3.62, control selectivity ≈1.7). Our work provides a scalable cost-effective route for high-quality monolayer h-BN synthesis for sub-atomic scale separations (H<sup>+</sup>/D<sup>+</sup>) and demonstrates the broader potential of machine learning-guided optimization of CVD for advancing synthesis of 2D materials.
Authors
- Andrew E. Naclerio (ORCID: https://orcid.org/0000-0002-0914-1008)
- Pavan Chaturvedi (ORCID: https://orcid.org/0000-0001-8494-5834)
- Ivan Vlassiouk (ORCID: https://orcid.org/0000-0002-5494-0386)
- Piran R. Kidambi (ORCID: https://orcid.org/0000-0003-1546-5014)
- Nickolay V. Lavrik (ORCID: https://orcid.org/0000-0002-9543-5634)
- An‐Ping Li (ORCID: https://orcid.org/0000-0003-4400-7493)
- Liam Collins
- Saban M. Hus (ORCID: https://orcid.org/0000-0002-3410-9878)
- Martí Checa (ORCID: https://orcid.org/0000-0003-2607-6866)
Institutions
- Oak Ridge National Laboratory (US)
- Vanderbilt University (US)
- University of Florida (US)
Publication Details
- Journal
- Advanced Materials
- Published
- 2025-11-28
- DOI
- https://doi.org/10.1002/adma.202511868
- Primary Topic
- Graphene research and applications
- Type
- article
- Field-Weighted Citation Impact
- 0.00
Funders
- National Science Foundation
- U.S. Department of Energy
- Office of Science
- Oak Ridge National Laboratory