Two‐Dimensional Fluid‐Analytical Hybrid Modelling of the Electromagnetic Effects in Very High Frequency Capacitively Coupled Ar/CF <sub>4</sub> Plasmas

ABSTRACT In this study, a two‐dimensional fluid‐analytical hybrid model is employed to investigate the electromagnetic phenomena and plasma spatial distributions in Ar/CF₄ discharges. The results indicate that as interelectrode gap increases, the electromagnetic wavelength within plasmas becomes shorter, accompanied by the formation and inward movement of the wave node in the plasma density distribution. With CF₄ content rising, the discharge trends to be more electronegative, leading to the thicker sheath thickness and longer radial wavelength, and thus the plasma density shifts from bimodal profile into unimodal center‐high distribution. Increasing power could reduce the skin depth, and consequently, the inductive power deposition becomes pronounced at the radial edge, giving rise to the dominant skin effect and thus the edge‐high density profile.

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Publication Details

Journal
Plasma Processes and Polymers
Published
2025-11-27
DOI
https://doi.org/10.1002/ppap.70100
Primary Topic
Plasma Diagnostics and Applications
Type
article
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article

Two‐Dimensional Fluid‐Analytical Hybrid Modelling of the Electromagnetic Effects in Very High Frequency Capacitively Coupled Ar/CF 4 Plasmas

Yu‐Ru Zhang, You‐Nian Wang, X. Li
Plasma Processes and Polymers
Plasma Diagnostics and Applications
article

Two‐Dimensional Fluid‐Analytical Hybrid Modelling of the Electromagnetic Effects in Very High Frequency Capacitively Coupled Ar/CF 4 Plasmas

Yu‐Ru Zhang, You‐Nian Wang, X. Li
article en

Abstract

ABSTRACT In this study, a two‐dimensional fluid‐analytical hybrid model is employed to investigate the electromagnetic phenomena and plasma spatial distributions in Ar/CF₄ discharges. The results indicate that as interelectrode gap increases, the electromagnetic wavelength within plasmas becomes shorter, accompanied by the formation and inward movement of the wave node in the plasma density distribution. With CF₄ content rising, the discharge trends to be more electronegative, leading to the thicker sheath thickness and longer radial wavelength, and thus the plasma density shifts from bimodal profile into unimodal center‐high distribution. Increasing power could reduce the skin depth, and consequently, the inductive power deposition becomes pronounced at the radial edge, giving rise to the dominant skin effect and thus the edge‐high density profile.

Plasma Processes and PolymersVol. 23(3)
Dalian University of Technology (CN), Ministry of Education (ET)
Openalex Percentile: Top 63%
Plasma Diagnostics and Applications
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