Neutral Octa‐Adamantane Chalcogenidometalate Clusters via Amine Complexation and Organotin Termination for Nanolithography

Supertetrahedral chalcogenidometalate clusters, inspired by zinc-blende-type quantum dots, integrate both chemical and geometrical uniqueness. However, their inherent negative charge and rigid T<sub>d</sub> symmetry restrict configurational diversity and functional utility. Herein, a synergistic strategy combining polyamine coordination and butyltin termination is employed to synthesize neutral chalcogenidometalate supertetrahedral clusters. Two distinct classes are presented: (1) tetra-adamantane clusters (TA-amine; amine = tris(2-aminoethyl)amine (TAEA), triethylenetetramine (TETA), tetraethylenepentamine (TEPA)) with 14 metal sites and (2) octa-adamantane clusters (OA-X; X═S/Se) with 20 metal sites-the largest neutral supertetrahedral clusters known to date. The OA-X clusters exhibit unprecedented C<sub>2v</sub> geometry, deviating from conventional T<sub>d</sub>, thereby validating the efficacy of polyamine-arylstannane synergy in advancing cluster chemistry. Charge neutrality and peripheral organic shells confer exceptional solubility and stability in some common solvents, enabling the fabrication of high-quality films for nanopatterning. Electron beam lithography (EBL) reveals that OA-X-based films enable 50 nm line patterning, with the OA-Se version demonstrating the higher sensitivity-a result attributable to the large photoabsorption cross-section of selenium. Solubility-switching behavior is attributed to radiation-induced phase transitions from discrete clusters to chalcogenidometalate nanoparticles. This work bridges molecular precision with functional material design, offering insights into charge-neutral cluster engineering for extreme ultraviolet (EUV) nanolithography.

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Publication Details

Journal
Angewandte Chemie International Edition
Published
2025-11-27
DOI
https://doi.org/10.1002/anie.202523993
Primary Topic
Crystal Structures and Properties
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article
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article

Neutral Octa‐Adamantane Chalcogenidometalate Clusters via Amine Complexation and Organotin Termination for Nanolithography

Qipu Lin, Ming‐Bu Luo, Er‐Xia Chen, Juan Wang et al.
Angewandte Chemie International Edition
Crystal Structures and Properties
article

Neutral Octa‐Adamantane Chalcogenidometalate Clusters via Amine Complexation and Organotin Termination for Nanolithography

Qipu Lin, Ming‐Bu Luo, Er‐Xia Chen, Juan Wang, Jian Zhang, Jin‐Xia Yang
article en

Abstract

Supertetrahedral chalcogenidometalate clusters, inspired by zinc-blende-type quantum dots, integrate both chemical and geometrical uniqueness. However, their inherent negative charge and rigid T<sub>d</sub> symmetry restrict configurational diversity and functional utility. Herein, a synergistic strategy combining polyamine coordination and butyltin termination is employed to synthesize neutral chalcogenidometalate supertetrahedral clusters. Two distinct classes are presented: (1) tetra-adamantane clusters (TA-amine; amine = tris(2-aminoethyl)amine (TAEA), triethylenetetramine (TETA), tetraethylenepentamine (TEPA)) with 14 metal sites and (2) octa-adamantane clusters (OA-X; X═S/Se) with 20 metal sites-the largest neutral supertetrahedral clusters known to date. The OA-X clusters exhibit unprecedented C<sub>2v</sub> geometry, deviating from conventional T<sub>d</sub>, thereby validating the efficacy of polyamine-arylstannane synergy in advancing cluster chemistry. Charge neutrality and peripheral organic shells confer exceptional solubility and stability in some common solvents, enabling the fabrication of high-quality films for nanopatterning. Electron beam lithography (EBL) reveals that OA-X-based films enable 50 nm line patterning, with the OA-Se version demonstrating the higher sensitivity-a result attributable to the large photoabsorption cross-section of selenium. Solubility-switching behavior is attributed to radiation-induced phase transitions from discrete clusters to chalcogenidometalate nanoparticles. This work bridges molecular precision with functional material design, offering insights into charge-neutral cluster engineering for extreme ultraviolet (EUV) nanolithography.

Angewandte Chemie International EditionVol. 65(13)
Chinese Academy of Sciences (CN), Fujian Institute of Research on the Structure of Matter (CN), Tan Kah Kee Innovation Laboratory (CN)
Openalex Percentile: Top 73%
Crystal Structures and Properties
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