Multidimensional defect identification of semiconductors in nonequilibrium

While the static theory for understanding defect properties in semiconductors in equilibrium has been established for decades, it fails to identify the crucial defects in nonequilibrium, such as under irradiation. In this paper, we develop a robust ab initio-driving multiscale modeling framework to identify deep-level defects in irradiated semiconductors with multidimensional defect properties. It overcomes two challenges unsolved in the past studies, that is, unambiguous nonequilibrium defect identification and exact deep-level transient spectroscopy (DLTS) simulation. Our method, verified by identifying the well-known deep-level defects in neutron-irradiated Si, is successfully applied to identify the controversial deep levels in neutron-irradiated wide-bandgap semiconductor, 4H-SiC, contributing to solving the half-century mystery of their atomic origin. Furthermore, we discover that defect origins of the same DLTS peaks vary significantly with annealing temperature, due to different defect types with distinct dynamic behaviors, breaking the long-lasting belief derived from the static defect theory. Our study not only expands the understanding of nonequilibrium defect physics of semiconductors, but also lays a solid foundation for controlling targeted crucial defects to improve material properties and device performances.

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Publication Details

Journal
Nature Communications
Published
2025-11-27
DOI
https://doi.org/10.1038/s41467-025-65718-8
Citations
1
Primary Topic
Silicon Carbide Semiconductor Technologies
Type
article
Field-Weighted Citation Impact
0.73

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article

Multidimensional defect identification of semiconductors in nonequilibrium

Xiaolan Yan, Linyue Liu, Bing Qiang Huang, Jun Liu et al.
1 citations
Nature Communications
Silicon Carbide Semiconductor Technologies
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article

Multidimensional defect identification of semiconductors in nonequilibrium

Xiaolan Yan, Linyue Liu, Bing Qiang Huang, Jun Liu, Chuanguo Zhang, Yonggang Li, Zhi Zeng, Yang Gao
article en
1 citations

Abstract

While the static theory for understanding defect properties in semiconductors in equilibrium has been established for decades, it fails to identify the crucial defects in nonequilibrium, such as under irradiation. In this paper, we develop a robust ab initio-driving multiscale modeling framework to identify deep-level defects in irradiated semiconductors with multidimensional defect properties. It overcomes two challenges unsolved in the past studies, that is, unambiguous nonequilibrium defect identification and exact deep-level transient spectroscopy (DLTS) simulation. Our method, verified by identifying the well-known deep-level defects in neutron-irradiated Si, is successfully applied to identify the controversial deep levels in neutron-irradiated wide-bandgap semiconductor, 4H-SiC, contributing to solving the half-century mystery of their atomic origin. Furthermore, we discover that defect origins of the same DLTS peaks vary significantly with annealing temperature, due to different defect types with distinct dynamic behaviors, breaking the long-lasting belief derived from the static defect theory. Our study not only expands the understanding of nonequilibrium defect physics of semiconductors, but also lays a solid foundation for controlling targeted crucial defects to improve material properties and device performances.

Nature CommunicationsVol. 16(1)
University of Science and Technology of China (CN), Hefei University of Technology (CN), Chinese Academy of Sciences (CN), Beijing Normal University (CN), Beijing Computational Science Research Center (CN), Northwest Institute of Nuclear Technology (CN), Institute of Solid State Physics (CN)
National Natural Science Foundation of China, Chinese Academy of Sciences, Youth Innovation Promotion Association of the Chinese Academy of Sciences, Natural Science Foundation of Anhui Province, Hefei Institutes of Physical Science, Chinese Academy of Sciences, Youth Innovation Promotion Association, Science Challenge Project
Openalex Percentile: Top 21%
Silicon Carbide Semiconductor Technologies
0.73
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