Direct Photopatterning Strategies for Ultrafine Quantum Dot Pixel Arrays and Micropatterned Light‐Emitting Diodes

ABSTRACT The practical application of quantum dot (QD) patterning technologies has consistently been a focal point of research in various optoelectronic devices, including light‐emitting diodes (LEDs), biosensors, and photodetectors. In particular, ultrafine directly photopatterned QD pixel arrays are considered promising candidates for high‐quality displays owing to their significant attributes such as simple fabrication, superior pixel quality, and enhanced device performance. This review thoroughly examines the recent advancements in direct colloidal QD photopatterning techniques. Specifically, this paper elaborates on the types of direct photopatterning methods, including photoresist/composite self‐curing, ligand exchange/stripping/cleavage, ligand/additive crosslinking, and other techniques for directly photoinducing QD patterns without a development process (that is, QDs and patterns are formed simultaneously). Furthermore, this paper discusses the application of these photopatterning methods to micro‐LED displays and electroluminescent QD‐LEDs, as well as their future trends and perspectives.